Sparse identification modeling and predictive control of wafer temperature in an atomic layer etching reactor

Ou, Feiyang; Abdullah, Fahim; Wang, Henrik; Tom, Matthew; Orkoulas, Gerassimos; Christofides, Panagiotis D.

doi:10.1016/j.cherd.2023.12.024

Chemical Engineering Research and Design

2024

DOI: 10.1016/j.cherd.2023.12.024

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Sparse identification modeling and predictive control of wafer temperature in an atomic layer etching reactor

Feiyang Ou,

Fahim Abdullah,

Henrik Wang

et al.

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Sparse identification modeling and predictive control of wafer temperature in an atomic layer etching reactor

Cited by 1 publication

References 30 publications

Hybrid deterministic and stochastic approach for dynamic simulation of photoinduced atom-transfer radical polymerization processes with microscopic resolution

Hybrid deterministic and stochastic approach for dynamic simulation of photoinduced atom-transfer radical polymerization processes with microscopic resolution

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