1967
DOI: 10.1016/0010-938x(67)80031-3
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Some aspects of anodic passivity of silicon single crystals

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1969
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Cited by 2 publications
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“…Thickness of the anodic oxide film depends on the applied potential. Oxide thickness increases continuously up to a certain potential, beyond which the film becomes unstable along with onset of oxygen evolution [1,4,10,11]. Current runaway occurred at the onset of oxygen evolution, which is attributed to breakdown of the oxide film [4,11].…”
mentioning
confidence: 99%
“…Thickness of the anodic oxide film depends on the applied potential. Oxide thickness increases continuously up to a certain potential, beyond which the film becomes unstable along with onset of oxygen evolution [1,4,10,11]. Current runaway occurred at the onset of oxygen evolution, which is attributed to breakdown of the oxide film [4,11].…”
mentioning
confidence: 99%