Solventless Surface Photoinitiated Polymerization:  Grafting Chemical Vapor Deposition (gCVD)

Martin, Tyler; Sedransk, Kyra L.; Chan, Kelvin; Baxamusa, Salmaan H.; Gleason, Karen K.

doi:10.1021/ma070150v

Cited by 28 publications

(19 citation statements)

References 32 publications

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“…Alternatively, the decomposition can be achieved by a low energy plasma discharge, termed, initiated plasma enhanced CVD (iPECVD),57 or by UV light, termed photo initiated CVD (piCVD) 58. A variant of piCVD is grafted CVD (gCVD), in which the benzophenone (BP), when photo‐decomposed, creates radical sites directly on the surface of the substrate 59. The reaction of the surface radicals with the monomer species results in covalently tethered chains.…”

Section: Chain Growth Polymerization: Icvdmentioning

confidence: 99%

25th Anniversary Article: CVD Polymers: A New Paradigm for Surface Modifi cation and Device Fabrication

et al. 2013

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Well-adhered, conformal, thin (<100 nm) coatings can easily be obtained by chemical vapor deposition (CVD) for a variety of technological applications. Room temperature modification with functional polymers can be achieved on virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. CVD film growth proceeds from the substrate up, allowing for interfacial engineering, real-time monitoring, and thickness control. Initiated-CVD shows successful results in terms of rationally designed micro- and nanoengineered materials to control molecular interactions at material surfaces. The success of oxidative-CVD is mainly demonstrated for the deposition of organic conducting and semiconducting polymers.

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Section: Chain Growth Polymerization: Icvdmentioning

confidence: 99%

25th Anniversary Article: CVD Polymers: A New Paradigm for Surface Modifi cation and Device Fabrication

et al. 2013

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“…This UV grafting procedure was also used for vapor‐phase grafting of maleic anhydride onto poly(ethylene terephthalate) substrates for protein coupling applications 232. Grafting CVD, using UV‐initiated benzophenone at 254 nm is a low temperature process for covalently tethering antimicrobial dimethylamino methyl styrene polymers to nylon fabric 233…”

Section: Characteristics Of Cvd Polymersmentioning

confidence: 99%

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

et al. 2010

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Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external stimuli. Traditional wet-chemical chain- and step-growth mechanisms guide the development of new heterogeneous CVD polymerization techniques. Commonality with inorganic CVD methods facilitates the fabrication of hybrid devices. CVD polymers bridge microfabrication technology with chemical, biological, and nanoparticle systems and assembly. Robust interfaces can be achieved through covalent grafting enabling high-resolution (60 nm) patterning, even on flexible substrates. Utilizing only low-energy input to drive selective chemistry, modest vacuum, and room-temperature substrates, CVD polymerization is compatible with thermally sensitive substrates, such as paper, textiles, and plastics. CVD methods are particularly valuable for insoluble and infusible films, including fluoropolymers, electrically conductive polymers, and controllably crosslinked networks and for the potential to reduce environmental, health, and safety impacts associated with solvents. Quantitative models aid the development of large-area and roll-to-roll CVD polymer reactors. Relevant background, fundamental principles, and selected applications are reviewed.

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“…[14] In this variant of piCVD, reaction of the surface radical with monomer species results in covalently tethered chains. This grafting procedure, termed grafting CVD (gCVD), greatly enhances the adhesion and durability of the resulting polymer film.…”

Section: Initiated Chemical Vapor Deposition (Icvd)mentioning

confidence: 99%

Initiated and Oxidative Chemical Vapor Deposition of Polymeric Thin Films: iCVD and oCVD

Tenhaeff

Gleason

2008

Adv Funct Materials

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304

294

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The techniques of initiated chemical vapor deposition (iCVD) and oxidative chemical vapor deposition (oCVD) enable the fabrication of chemically well‐defined thin polymeric films on complex objects with micro‐ and nano‐scale features. By depositing polymers from the vapor phase, many wetting and solution effects are avoided, and conformal films can be created. In iCVD, a variant of hot filament CVD, the deposition rate is enhanced and chemical functionalities of the polymers' constituents are maintained by including a thermally labile initiator in the feed stream. Due to the low energy required when using an initiator, delicate substrates can be coated. In oCVD, infusible, electrically conductive films are formed directly on the substrate of interest as the oxidant and monomer are introduced into the reactor simultaneously. This Feature Article provides an overview of the work that has been done to develop iCVD and oCVD into platform technologies. Relevant background, fundamentals, and applications will be discussed.

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Solventless Surface Photoinitiated Polymerization: Grafting Chemical Vapor Deposition (gCVD)

Cited by 28 publications

References 32 publications

25th Anniversary Article: CVD Polymers: A New Paradigm for Surface Modifi cation and Device Fabrication

25th Anniversary Article: CVD Polymers: A New Paradigm for Surface Modifi cation and Device Fabrication

Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films

Initiated and Oxidative Chemical Vapor Deposition of Polymeric Thin Films: iCVD and oCVD

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