2019
DOI: 10.1016/j.tsf.2019.137585
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Solvent-free and large area compatible deposition of methylammonium lead bromide perovskite by close space sublimation and its application in PIN diodes

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Cited by 4 publications
(7 citation statements)
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“…Previous studies have shown perovskite single crystals (2–3 mm) detecting gammas. , Our simulation calculated the penetration depth of 1.4 MeV alphas in MAPbBr 3 to be 7 μm. Then, the perovskite thickness needed to absorb 100% of alphas from the 10 B reaction can be as thin as 7 μm . The advantage of the reduced perovskite thickness is that fewer gammas will be detected without compromising neutron detection.…”
Section: Resultsmentioning
confidence: 99%
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“…Previous studies have shown perovskite single crystals (2–3 mm) detecting gammas. , Our simulation calculated the penetration depth of 1.4 MeV alphas in MAPbBr 3 to be 7 μm. Then, the perovskite thickness needed to absorb 100% of alphas from the 10 B reaction can be as thin as 7 μm . The advantage of the reduced perovskite thickness is that fewer gammas will be detected without compromising neutron detection.…”
Section: Resultsmentioning
confidence: 99%
“…Then, the perovskite thickness needed to absorb 100% of alphas from the 10 B reaction can be as thin as 7 μm. 44 The advantage of the reduced perovskite thickness is that fewer gammas will be detected without compromising neutron detection. Figure S5 shows that if the perovskite thickness is reduced from 800 to 100 μm, the total number of counts from a 137 Cs gamma source decreases from ∼2 × 10 5 to ∼3 × 10 4 , almost 1 order of magnitude.…”
Section: Resultsmentioning
confidence: 99%
“…Both TiO 2 and NiO have been explored for several MAPbX 3 - and CsPbX 3 -based devices, although independently and usually not evaporated. 38 In this case, NiO was deposited by reactive magnetron sputtering on top of ITO, controlling the resistivity of the films by controlling the amount of oxygen during deposition. This approach to obtain NiO films has been reported before.…”
Section: Resultsmentioning
confidence: 99%
“…MAPbX3 and CsPbX3 devices: mesoporous or compact TiO2 as ETL, commonly deposited by spin coating, 3,17,22,30 and NiO as HTL, mainly deposited by magnetron sputtering or pulsed laser deposition and utilized in inverted devices; 38,39,40 regardless, the implementation of both TiO2 and NiO in the same structure is not common. In this paper, we evaluate the deposition of CsPbI3 by thermal evaporation in a co-evaporation approach, offering good thickness control and reproducibility.…”
Section: Introductionmentioning
confidence: 99%
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