1982
DOI: 10.1103/physrevlett.49.560
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Solution to the Surface Registration Problem Using X-Ray Standing Waves

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Cited by 243 publications
(70 citation statements)
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“…The XSW analysis from oxidized surface showed random distribution of the S both in (0 0 0 6) and (10)(11)(12)(13)(14) directions.…”
Section: Xsw Analysismentioning
confidence: 99%
See 1 more Smart Citation
“…The XSW analysis from oxidized surface showed random distribution of the S both in (0 0 0 6) and (10)(11)(12)(13)(14) directions.…”
Section: Xsw Analysismentioning
confidence: 99%
“…The XSW method has been used to measure atomic-scale position of adsorbed atoms on surfaces utilizing the spatial variation of electric field intensity of the standing wave generated by the coherent interference between incident and Bragg diffracted X-rays [10][11][12][13]. By scanning the sample angle or incident X-ray energy through the Bragg condition, the XSW nodes moves from the Bragg diffraction planes to the middle between adjacent Bragg planes.…”
Section: Introductionmentioning
confidence: 99%
“…Passivation of silicon surfaces by adsorbed bromine, observed in experiments on samples prepared by a wet chemical method [13][14][15][16][17] and theoretical calculations [18], has raised a number of possibilities of both scientific and technological importance. These include the possibility that such passivated surfaces might permit epitaxy of thin overlayer films and growth of self-assembled structures without the expensive and, from production standpoint, unacceptable need for ultra high vacuum (UHV) processing.…”
Section: Introductionmentioning
confidence: 99%
“…It appears that the corrections should be added for t larger than several hundred A. The thickness t should be understood as the effective thickness which is larger than the nominal one for inclined Bragg reflections in XSW experiences (Golovchenko, Patel, Kaplan, Cowan & Bedzyk, 1982;Taccoen, Malgrange, Zheng, Boulliard & Capelle, 1994). For an inclined symmetric reflection, for instance, the effective thickness is increased from the nominal one by the factor 1 / cos(-n, h) with (-n, h) the angle between the crystal surface normal vector -n and the reflecting vector h.…”
Section: L(jl(z = T) = I(b)(z = T) Given By (14)mentioning
confidence: 99%