2019
DOI: 10.1007/s10854-019-02103-4
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Solution-produced copper iodide thin films for photosensor and for vertical thermoelectric nanogenerator, which uses a spontaneous temperature gradient

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Cited by 10 publications
(8 citation statements)
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“…The band gap of the CuI films varies in the range of 2.71–3.14 eV for the deposition time of 5–10 min. These results are consistent with previous reports [43,48–49] . However, this change in band gap may be engineered for solving the problem of valance band offset in CuI/n−Si solar cell that would enhance the performance of the solar cells [50–51] .…”
Section: Resultssupporting
confidence: 92%
“…The band gap of the CuI films varies in the range of 2.71–3.14 eV for the deposition time of 5–10 min. These results are consistent with previous reports [43,48–49] . However, this change in band gap may be engineered for solving the problem of valance band offset in CuI/n−Si solar cell that would enhance the performance of the solar cells [50–51] .…”
Section: Resultssupporting
confidence: 92%
“…Deposition of copper iodide films via SILAR was carried out at room temperature in accordance with [15] using an aqueous solution containing 0.1 M CuSO4 and 0.1 M Na2S2O3 as the cationic precursor, where a copper (I) thiosulfate complex Na[Cu(S2O3)] was formed, from which Cu + ions were released into solution. The PET substrates were immersed into the cationic precursor for 20 s. Then, the substrates were washed in distilled water for 10 s. For the reaction of the strongly adsorbed Cu + ions on the PET surface with I − ions to obtain some CuI monolayers, the substrate was then immersed for 20 s into aqueous NaI solution (anionic precursor), whose concentration was 0.05, 0.075 or 0.1 M. After that, the PET substrate with the thinnest CuI film was washed in distilled water for 10 s. The listed procedure was one SILAR cycle of CuI film deposition.…”
Section: Methodsmentioning
confidence: 99%
“…As UV protective canopies and other UV shields should have large areas, a preference must be given to affordable and mass-production deposition methods. Among such methods, Successive Ionic Layer Adsorption and Reaction (SILAR) technique allows deposition of the nanostructured doped and undoped ZnO [14] and CuI [11,15] thin films over large areas and suggests low capital expenditure based on simple process equipment.…”
Section: Introductionmentioning
confidence: 99%
“…The effectiveness of complexes in sensors relies heavily on producing thin films ( Klochko et al, 2019 ). By reducing the density of the complex molecule through vapor exposure, changes in the complex can be more easily observed.…”
Section: Introductionmentioning
confidence: 99%