“…MS analysis confirmed the high quality of the Schottky junction properties, which were consistent during the application of various frequencies (1 kHz to 20 kHz). The procedure for estimating the band edges in the MS analysis is detailed elsewhere. , Estimated energy band parameters of the AgNWs-embedding ITO film at the Si interface, determined using MS analysis, are shown in Figure b, where E O , E C , E F , E V , ϕ bi , and SCR are the vacuum level, conduction band, Fermi level, valence band, built in potential, and space charge region, respectively. The present MS analyses reveal that the formation of a 950 nm wider SCR led to a value of ϕ bi of 0.7 eV because of the 4.23 eV value of work function of the AgNWs-embedding ITO film on the p-Si; this work function value in turn influenced the polarization of the free charges.…”