2015
DOI: 10.1016/j.matlet.2015.07.142
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Solution-processed transparent conducting Ag nanowires layer for photoelectric device applications

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Cited by 14 publications
(8 citation statements)
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“…22,23 These values are remarkably faster than any other reported AgNW-based photodetector. 9,16,24 Understandably, such a fast photoresponse speed could be associated with the high-quality Schottky barrier (∼0.65 eV) formed between the AgNWs and p-Si, which can facilitate effective and rapid separation of photogenerated charge carriers. This result clearly indicates the advantage of the Schottky junction compared to a conventional p−n junction photodetector, which requires doping, resulting in high-temperature processes and a defective material.…”
Section: Introductionmentioning
confidence: 99%
“…22,23 These values are remarkably faster than any other reported AgNW-based photodetector. 9,16,24 Understandably, such a fast photoresponse speed could be associated with the high-quality Schottky barrier (∼0.65 eV) formed between the AgNWs and p-Si, which can facilitate effective and rapid separation of photogenerated charge carriers. This result clearly indicates the advantage of the Schottky junction compared to a conventional p−n junction photodetector, which requires doping, resulting in high-temperature processes and a defective material.…”
Section: Introductionmentioning
confidence: 99%
“…MS analysis confirmed the high quality of the Schottky junction properties, which were consistent during the application of various frequencies (1 kHz to 20 kHz). The procedure for estimating the band edges in the MS analysis is detailed elsewhere. , Estimated energy band parameters of the AgNWs-embedding ITO film at the Si interface, determined using MS analysis, are shown in Figure b, where E O , E C , E F , E V , ϕ bi , and SCR are the vacuum level, conduction band, Fermi level, valence band, built in potential, and space charge region, respectively. The present MS analyses reveal that the formation of a 950 nm wider SCR led to a value of ϕ bi of 0.7 eV because of the 4.23 eV value of work function of the AgNWs-embedding ITO film on the p-Si; this work function value in turn influenced the polarization of the free charges.…”
Section: Results and Discussionmentioning
confidence: 99%
“…Here it is assumed that an ideal anisotype heterojunction is formed at the contact between AgNWs embedded ITO and Si layers and the built in potential V bi corresponds to the difference in their work function [28,29]. Depletion zones are formed on both the sides and are modulated by the applied bias.…”
Section: Impedance Spectroscopy (Is) Analysis Of Solar Cellmentioning
confidence: 99%