Abstract:Atomic layer deposition in solution (sALD) is just emerging as a technology for the preparation of thin films. Unlike ALD from the gas phase, it allows for mild reaction conditions in a solvent phase and at room temperature, thus decreasing the energy requirements of the process and widening the range of accessible precursor molecules. In this work, the deposition of thin films of titania on silica is investigated using titanium(IV) isopropoxide (TTIP) and water as precursors, which are alternatingly brought i… Show more
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