Solid immersion lens applications for nanophotonic devices

Abstract

Abstract. Solid immersion lens (SIL) microscopy combines the advantages of conventional microscopy with those of near-field techniques, and is being increasingly adopted across a diverse range of technologies and applications. A comprehensive overview of the state-of-the-art in this rapidly expanding subject is therefore increasingly relevant. Important benefits are enabled by SIL-focusing, including an improved lateral and axial spatial profiling resolution when a SIL is used in laser-scanning microscopy or excitation, and an improved collection efficiency when a SIL is used in a light-collection mode, for example in fluorescence micro-spectroscopy. These advantages arise from the increase in numerical aperture (NA) that is provided by a SIL. Other SIL-enhanced improvements, for example spherical-aberration-free sub-surface imaging, are a fundamental consequence of the aplanatic imaging condition that results from the spherical geometry of the SIL. The theory of SIL imaging exposes the unique properties of SILs that provide advantages in applications involving the interrogation of photonic and electronic nanostructures. Such applications range from the sub-surface examination of the complex three-dimensional microstructures fabricated in silicon integrated circuits, to quantum photoluminescence and transmission measurements in semiconductor quantum dot nanostructures.

Sub-wavelength Laser Nanopatterning using Droplet Lenses

“…In particular, DALP uses micrometer-size droplets whose contact angle with the surface is about 90° (almost perfect hemispherical shape). By placing such a droplet at the focal plane of an optical system, the effective numerical aperture of the system increases and, consequently, enhancement in lateral as well as axial resolution is achieved 24 . Most importantly, droplet focusing is carried out without introducing spherical or coma aberrations.…”

Organic–Inorganic Eu3+/Tb3+ codoped hybrid films for temperature mapping in integrated circuits

“…In fact, the use of conventional optical microscopy for temperature mapping set the Rayleigh criterion as the ultimate spatial resolution limit (Tessier et al, 2007; Serrels et al, 2008): $\delta x_{RL}=1.22\frac{y\lambda }{D}=1.22\frac{\lambda }{NA}$ where λ is the maximum wavelength, y is the distance to the emitting surface, D is the diameter of the detector and NA is the correspondent numerical aperture. In recent years, a number of fluorescence imaging techniques with sub-diffraction-limit resolution have been developed, achieving a spatial resolution until 0.01 μm (Rust et al, 2006).…”

Increasing Light Absorption and Collection Using Engineered Structures

“…Figure 8c and d show a 2D flake before and after being magnified through the application of a SIL. This magnification increase arises from the SIL creating an optical lever effect [60] (i.e. moving the focal position laterally across the SIL produces a smaller lateral movement under the SIL).…”