Sol-gel TiO2 films on silicon substrates

Воротилов, К. А.; Orlova, Evguenia; Petrovsky, Vladimir

doi:10.1016/0040-6090(92)90120-z

Cited by 100 publications

(33 citation statements)

References 13 publications

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“…Vorotilov et al [20] determined an index of 2 for anatase, which is in agreement with the present data. The refractive index of Ti02 thin films prepared by ion beam assisted deposition methods lies between 2.3 and 2.7 [21].…”

Section: Discussionsupporting

confidence: 82%

Optical studies on sol–gel derived titanium dioxide films

Ray

Tracey

McQuillin

et al. 2000

IEE Proceedings - Science, Measurement and Technology

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Section: Discussionsupporting

confidence: 82%

Optical studies on sol–gel derived titanium dioxide films

Ray

Tracey

McQuillin

et al. 2000

IEE Proceedings - Science, Measurement and Technology

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“…Many different techniques can be used to deposit TiO 2 such as sol-gel process [8][9][10], chemical vapour deposition [11][12][13][14][15], ion beam depositions [16], and magnetron sputtering [17][18][19][20][21]. In this project the latter technique has been used to produce titania coatings, which were post-deposition annealed over a range of temperatures to allow their subsequent structural development to be investigated.…”

Section: Introductionmentioning

confidence: 99%

Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings

et al. 2013

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Titanium dioxide thin films are durable, chemically stable, have a high refractive index and good electro/photochemical proprieties. Consequently, they are widely used as anti-reflective layers in optical devices and large area glazing products, dielectric layers in microelectronic devices and photo catalytic layers in self-cleaning surfaces. Titania coatings may have amorphous or crystalline structures, where three crystalline phases of TiO 2 can be obtained: anatase, rutile and brookite, although the latter is rarely found. It is known, however, that the structure of TiO 2 coatings is sensitive to deposition conditions and can also be modified by post-deposition heat treatments. In this study, titania coatings have been deposited onto soda-lime glass substrates by reactive sputtering from a metallic target. The magnetron was driven in mid-frequency pulsed DC mode. The as-deposited coatings were analysed by micro Raman spectroscopy, X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Selected coatings were annealed at temperatures in the OPEN ACCESSCoatings 2013, 3 167 range 200-700 °C and re-analysed. Whilst there was weak evidence of a nanocrystallinity in the as-deposited films, it was observed that these largely amorphous low temperature structures converted into strongly crystalline structures at annealing temperatures above 400 °C.

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“…The occurrence of anatase and rutile phase of TiO 2 thin films mainly depends on the deposition method, process parameters and substrate temperature. Many techniques are used to deposit TiO 2 films, including sol-gel processes [4], reactive evaporation [5], chemical vapor deposition [6], sputtering [7,8] and pulsed laser deposition (PLD) [9]. Among these techniques, pulsed laser deposition (PLD) is a simple technique to prepare high quality films from metal, semiconductors and ceramics.…”

Section: Introductionmentioning

confidence: 99%

Effect of substrate temperature on microstructure and properties of nanocrystalline titania thin films prepared by pulsed laser deposition

Balakrishnan¹,

Manavalan²,

Babu³

et al. 2016

Nanosystems: Phys. Chem. Math.

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Titanium oxide (TiO 2 ) films were deposited on silicon (100) and quartz substrates at various substrate temperatures (300 -873 K) at an optimized oxygen partial pressure of 3.0 × 10 −2 mbar by pulsed laser deposition. The effect of substrate temperature on structure, surface morphology and optical properties of the films were investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and photoluminescence spectroscopy (PL) respectively. The XRD results showed that the films are polycrystalline in nature and have tetragonal structure. The film prepared at higher substrate temperature showed strong rutile phase. The results indicated that all the films possess both phases (anatase and rutile) of titania. The AFM shows the crystalline nature, dense, uniform distribution of the nanocrystallites with a surface roughness of 2 -8 nm. The photoluminescence studies showed the asymmetric peak ∼ 370 nm indicating the bandgap for the TiO 2 films.

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Sol-gel TiO2 films on silicon substrates

Cited by 100 publications

References 13 publications

Optical studies on sol–gel derived titanium dioxide films

Optical studies on sol–gel derived titanium dioxide films

Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings

Effect of substrate temperature on microstructure and properties of nanocrystalline titania thin films prepared by pulsed laser deposition

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