Niobium oxide has attracted extensive interest in recent years because its thin film is a promising cathodic electrochromic material for application in solar energy management, 1 display devices, 2-3 and sensors. 4 Preliminary work on the electrochromism of Nb 2 O 5 films has been reported, 5 and the thin films were grown by thermal oxidation at 500ЊC on a niobium metallic disk. In recent years, several other deposition techniques including dc magnetron sputtering, 6-7 the sol-gel process, 8-10 and dip-coating, 11 were employed for Nb 2 O 5 thin film fabrication. These Nb 2 O 5 thin films showed excellent electrochromic properties with rapid and reversible coloration when Li ϩ ions are inserted in Nb 2 O 5 , and their properties have been demonstrated to be strongly dependent on the deposition method, and the annealing treatment. For example, Pawlicka et al. 9 found that after the insertion of lithium ions the optical absorption spectra of annealed Nb 2 O 5 films are different for the annealing temperatures of 400 and 600ЊC. Yoshimura et al. 6 reported that the excellent electrochromism of crystallized Nb 2 O 5 film can be deposited by dc magnetron sputtering with a substrate temperature of 500ЊC in an oxygen ambient.Recently, pulsed laser deposition (PLD) has been widely recognized as a promising versatile technique for the fabrication of thin films of metallic oxides. It has been used successfully to grow LiCoO 2 , LiMn 2 O 4 , and V 2 O 5 thin films with excellent electrochemical properties. 12,13 Its main advantages are the ability to transfer the original stoichiometry of a bulk target to the deposited film, the capability for reactive deposition in ambient reactive gas, a relatively simple deposition apparatus. In addition, laser ablation deposition is environmentally friendly.In our laboratory, Ta 2 O 5 films with high-quality electrical properties were deposited by this technique. 14,15 To our knowledge, there is no report on the fabrication of niobium oxide film with high quality of electrochromism properties by PLD. In this paper, we present the growth of niobium oxide thin film on indium-tin oxide coated glass substrate by 355 nm PLD in O 3 /O 2 gas mixture ambient. The electrochromic behavior of the lithium insertion in Nb 2 O 5 thin films is examined by using voltammetric and potentiostatic techniques simultaneously with transmittance measurements. We hope to gain some insight into the electrochromic mechanism of the Li inserted Nb 2 O 5 thin film. Experimental The apparatus for the Nb 2 O 5 film deposition has been described previously. 16 A stainless steel deposition chamber is evacuated by a turbomolecular pump to a base pressure of 1 ϫ 10 Ϫ3 Pa. The depositions are generally carried out with a continuous flow of the O 3 /O 2 gas mixture. Ozone is prepared from O 2 by Tesla coil discharge as a conventional discharge ozonizer. The ambient gas of O 3 /O 2 mixture is introduced via a glass tube and its pressure could be adjusted by a needle valve. A typical ambient gas pressure of 15 Pa is maintain...