2005
DOI: 10.1016/j.matlet.2005.06.007
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Sol-gel processed nanostructured CeO2–TiO2 thin films for electrochromic applications

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Cited by 19 publications
(7 citation statements)
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“…TiO 2 thin films can be prepared by different techniques such as reactive magnetron sputtering [7], sol-gel [8] and pulsed laser deposition (PLD) [9]. In the present study preparation of nanostructured titanium dioxide thin films using pulsed laser ablation technique in reactive atmosphere is discussed.…”
Section: Introductionmentioning
confidence: 98%
“…TiO 2 thin films can be prepared by different techniques such as reactive magnetron sputtering [7], sol-gel [8] and pulsed laser deposition (PLD) [9]. In the present study preparation of nanostructured titanium dioxide thin films using pulsed laser ablation technique in reactive atmosphere is discussed.…”
Section: Introductionmentioning
confidence: 98%
“…After the probe ssDNA was immobilized on the MWNTs/CeO 2 /CHIT modified electrode, the peak current decreased obviously (curve e). The reason seems to be related to the electrostatic repulsion between the polyanionic DNA immobilized on the electrode and the anionic redox couple ions ([Fe(CN) 6 ] 3À/4À ) [26].…”
Section: Hybridization Reaction and Determination Of Target Ssdnamentioning
confidence: 99%
“…At the same time, nanoscaled CeO 2 , as a kind of ceramic oxide materials, has also attracted extensive attention owing to its wide applications such as luminous material, catalysts, electronic ceramics, irradiation protectors, polishing materials, etc. [6,7]. So far, reports on nanoscaled CeO 2 materials have mainly focused on its synthesis [8][9][10][11].…”
Section: Introductionmentioning
confidence: 99%
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“…TiO 2 films can be deposited or grown on substrates such as Si, glass, sapphire, and quartz by using reactive sputtering, sol-gel spin coating, laser deposition, thermal evaporation, thermal oxidation of titanium, chemical vapor deposition and chemical spray pyrolysis techniques [7,[9][10][11][12]. The structural characteristics of TiO 2 films are affected by gas pressure and substrate temperature during the deposition process [13].…”
Section: Introductionmentioning
confidence: 99%