Sol-gel processed barium titanate waveguides

Bahtat, A.; Mugnier, J.; Bahtat, M.; Bovier, C.; Serughetti, J.

doi:10.1007/bf00486308

Cited by 7 publications

(4 citation statements)

References 7 publications

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“…Moreover, at such an annealing temperature, roughness and crystallites do not limit waveguide performance so that optical losses of 2.5 + 0.4 dB/cm can be measured on these crystallized waveguides. The optical loss values obtained for ZrO2 waveguides are very close to those already obtained for other oxide guides (TiO2, for example) elaborated by sol-gel process [10].…”

Section: Resultssupporting

confidence: 72%

Planar ZrO2 waveguides prepared by the sol-gel process: Structural and optical properties

Urlacher

Dumas

Serughetti

et al. 1997

J Sol-Gel Sci Technol

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Abstract. ZrO2 waveguides are prepared by the sol-gel process from a solution containing zirconium n-propoxide and acetylacetone in propanol-2. Structural characterizations are investigated for different annealing temperatures using suitable techniques including Waveguide Raman Spectroscopy, Electron Microscopy and Atomic Force Microscopy. Films are amorphous at 300~ and the pure ZrO2 tetragonal crystalline phase appears beyond 400~ Crystallized films present a dense, uniform and polycrystalline structure made up by randomly oriented nanocrystallites, the diameter of which increases from 38/~ at 400~ to 53/~ at 600~ Waveguides are at least monomode TE0 at 632.8 nm. At this wavelength, optical losses are about 0.8 4-0.2 dB/cm for amorphous layers and increase up to 2.5 4-0.4 dB/cm for 600~ heat-treated waveguides.

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Section: Resultssupporting

confidence: 72%

Planar ZrO2 waveguides prepared by the sol-gel process: Structural and optical properties

Urlacher

Dumas

Serughetti

et al. 1997

J Sol-Gel Sci Technol

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“…The coating film samples were prepared basically after Phule and Risbud 11 and Bahtat et al, 12 Gel films were deposited on a 20 mm ϫ 40 mm ϫ 1.2 mm silica-glass substrate (Sumikin Quartz Product, Wakayama, Japan) by dip coating at a substrate withdrawal speed of 3 cm⅐min -1 . Unless otherwise noted, the gel films were transferred into a 700°C electric furnace just after gel film deposition, heated there for 10 min, and taken into the ambient atmosphere.…”

Section: (1) Preparationmentioning

confidence: 99%

“…The coating film samples were prepared basically after Phule and Risbud 11 and Bahtat et al, 12 with the addition of poly(vinylpyrrolidone) (PVP) to the starting solutions. Titanium tetraisopropoxide (Ti(OC 3 H 7 i ) 4 ; Wako Pure Chemical Industries, Osaka, Japan), barium acetate (Ba(CH 3 COO) 2 ; Wako Pure Chemical Industries), PVP with average molecular weights of 25 000 (Wako Pure Chemical Industries) and 630 000 (Tokyo Kassei Kogyo, Tokyo, Japan), N-vinyl-2-pyrrolidone (VP; Wako Pure Chemical Industries), acetic acid (CH 3 COOH; Wako Pure Chemical Industries), isopropyl alcohol (C 3 H 7 i OH; Wako Pure Chemical Industries), and distilled water were used as the starting materials.…”

Section: (1) Preparationmentioning

confidence: 99%

Single‐Step Dip Coating of Crack‐Free BaTiO₃ Films >1 μm Thick: Effect of Poly(vinylpyrrolidone) on Critical Thickness

Kozuka

Kajimura

2000

Journal of the American Ceramic Society

130

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BaTiO 3 coating films were prepared from Ba(CH 3 COO) 2 -Ti(OC 3 H 7 i ) 4 -H 2 O-CH 3 COOH-C 3 H 7 i OH solutions containing poly(vinylpyrrolidone) (PVP) via single-step, nonrepetitive dip coating. The critical thickness-i.e., the maximum film thickness achieved without crack formation via nonrepetitive dip coating-was successfully increased by incorporation of PVP in the precursor solution. Relatively dense, crack-free BaTiO 3 films >1 m in thickness were achieved via single-step deposition using a solution containing PVP of average molecular weight of 630 000. Incorporation of an excess amount of PVP, however, led to a decrease in the critical thickness. Highermolecular-weight PVP was more effective in increasing the critical thickness, whereas N-vinyl-2-pyrrolidone monomers did not affect the critical thickness. Stepwise heating of the gel films resulted in increased optical transmittance of the films, accompanied by film densification.

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“…Each of these thin-film deposition techniques has advantages and disadvantages. Excellent film properties have been reported for films deposited by sol-gel but this method is relatively slow and labor intensive [12,13,14,15,16]. CVD methods provide for conformal deposition into high aspect ratio features that can maximize electrode-to-dielectric surface area thus providing for increased capacitance in a given unit area but they require a cocktail of expensive and often toxic or flammable precursors [17,18,19,20].…”

Section: Introductionmentioning

confidence: 99%

Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications

et al. 2012

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New apparatus and a new process for the sputter deposition of modified barium titanate thin-films were developed. Films were deposited at temperatures up to 900 °C from a Ba0.96Ca0.04Ti0.82Zr0.18O3 (BCZTO) target directly onto Si, Ni and Pt surfaces and characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Film texture and crystallinity were found to depend on both deposition temperature and substrate: above 600 °C, the as-deposited films consisted of well-facetted crystallites with the cubic perovskite structure. A strongly textured Pt (111) underlayer enhanced the (001) orientation of BCZTO films deposited at 900 °C, 10 mtorr pressure and 10% oxygen in argon. Similar films deposited onto a Pt (111) textured film at 700 °C and directly onto (100) Si wafers showed relatively larger (011) and diminished intensity (00ℓ) diffraction peaks. Sputter ambients containing oxygen caused the Ni underlayers to oxidize even at 700 °C: Raising the process temperature produced more diffraction peaks of NiO with increased intensities. Thin-film capacitors were fabricated using ~500 nm thick BCZTO dielectrics and both Pt and Ni top and bottom electrodes. Small signal capacitance measurements were carried out to determine capacitance and parallel resistance at low frequencies and from these data, the relative permittivity (εr) and resistivity (ρ) of the dielectric films were calculated; values ranged from ~50 to >2,000, and from ~104 to ~1010 Ω∙cm, respectively.

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Sol-gel processed barium titanate waveguides

Cited by 7 publications

References 7 publications

Planar ZrO2 waveguides prepared by the sol-gel process: Structural and optical properties

Planar ZrO2 waveguides prepared by the sol-gel process: Structural and optical properties

Single‐Step Dip Coating of Crack‐Free BaTiO₃ Films >1 μm Thick: Effect of Poly(vinylpyrrolidone) on Critical Thickness

Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications

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Sol-gel processed barium titanate waveguides

Cited by 7 publications

References 7 publications

Planar ZrO2 waveguides prepared by the sol-gel process: Structural and optical properties

Planar ZrO2 waveguides prepared by the sol-gel process: Structural and optical properties

Single‐Step Dip Coating of Crack‐Free BaTiO3 Films >1 μm Thick: Effect of Poly(vinylpyrrolidone) on Critical Thickness

Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications

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Single‐Step Dip Coating of Crack‐Free BaTiO₃ Films >1 μm Thick: Effect of Poly(vinylpyrrolidone) on Critical Thickness