1997
DOI: 10.1016/s0040-6090(97)00295-2
|View full text |Cite
|
Sign up to set email alerts
|

Sol-gel prepared In2O3 thin films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
65
0
2

Year Published

2001
2001
2018
2018

Publication Types

Select...
7
2

Relationship

0
9

Authors

Journals

citations
Cited by 146 publications
(69 citation statements)
references
References 14 publications
0
65
0
2
Order By: Relevance
“…In ITO films the low binding energy O1s component (labeled as A) at ∼530 eV is attributed to oxygen in the oxide crystal, while the high binding energy one(s) (labeled as B) at ∼532 eV has been assigned to: (a) oxygen ions in oxygen-deficient regions, (b) oxygen atoms in an amorphous phase, (c) oxygen bound to Sn, (d) adsorbed oxygen species (Omx-) (e) hydroxyl groups associated to either adsorbed OH or In(OH)x, e.g. [15,16] Angle-resolved XPS data (not shown) suggested that adsorbed species did not have significant contribution to the presence of the high-binding energy shoulder. We suggest that the 532 eV component is attributed to the oxygen deficiency and the presence of the as-deposited amorphous ITO phase (Fig.…”
Section: Ito/p-type Si (001) Interfacementioning
confidence: 99%
“…In ITO films the low binding energy O1s component (labeled as A) at ∼530 eV is attributed to oxygen in the oxide crystal, while the high binding energy one(s) (labeled as B) at ∼532 eV has been assigned to: (a) oxygen ions in oxygen-deficient regions, (b) oxygen atoms in an amorphous phase, (c) oxygen bound to Sn, (d) adsorbed oxygen species (Omx-) (e) hydroxyl groups associated to either adsorbed OH or In(OH)x, e.g. [15,16] Angle-resolved XPS data (not shown) suggested that adsorbed species did not have significant contribution to the presence of the high-binding energy shoulder. We suggest that the 532 eV component is attributed to the oxygen deficiency and the presence of the as-deposited amorphous ITO phase (Fig.…”
Section: Ito/p-type Si (001) Interfacementioning
confidence: 99%
“…A wide range of deposition technologies has been used for the preparation of indium oxide films, such as dc and rf sputtering [6,7], evaporation [8,9], thermal oxidation of indium films [10], pulsed laser deposition [11], atomic layer epitaxy [12], spin coating [13] and the sol-gel method [14]. Sputtering is chosen very often among these techniques due to its high deposition rates, good film properties and process stability.…”
Section: Introductionmentioning
confidence: 99%
“…The XPS spectrum of In3d showed two individual peaks positioned at 444.6 eV and 452.0 eV, which are assigned to In3d 5=2 and In3d 3=2 and the binding energy value of indium suggests the presence of In 3þ . 32 The di®erence between the spinorbit coupling energy of heterostructures for Cu2p 3=2 and Cu2p 1=2 was ca. 20 eV as shown in Fig.…”
Section: -5mentioning
confidence: 99%