2016
DOI: 10.1016/j.tsf.2016.07.025
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Sol-gel derived oriented multilayer ZnO thin films with memristive response

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Cited by 12 publications
(10 citation statements)
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“…Another critical parameter on the synthesis process of resistive switching devices is the metal salt precursors, which are subdivided into three counter anions groups; [ 100 ] oxidants (hydrated nitrates), [ 72,79,80,98,101–121 ] reducers (alkoxides, [ 117,122–125 ] acetates, [ 72,76,78,79,104,105,109,111,113–118,126–153 ] and acetylacetonates [ 81,134,144,154–157 ] ), and neutrals (chlorine‐based). [ 63,71,103,107,110,112,116,119,125,132,158–164 ] Among these, oxidant counter ions are preferable due to the high oxidizing power (negative charge), greater solubility in water or polar organic solvents and low decomposition temperature, which are related to the electronic interactions between the metal and the nitrate group, as shown in Figure 9c.…”
Section: Fundamentals Of Solution‐based Metal Oxide Rramsmentioning
confidence: 99%
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“…Another critical parameter on the synthesis process of resistive switching devices is the metal salt precursors, which are subdivided into three counter anions groups; [ 100 ] oxidants (hydrated nitrates), [ 72,79,80,98,101–121 ] reducers (alkoxides, [ 117,122–125 ] acetates, [ 72,76,78,79,104,105,109,111,113–118,126–153 ] and acetylacetonates [ 81,134,144,154–157 ] ), and neutrals (chlorine‐based). [ 63,71,103,107,110,112,116,119,125,132,158–164 ] Among these, oxidant counter ions are preferable due to the high oxidizing power (negative charge), greater solubility in water or polar organic solvents and low decomposition temperature, which are related to the electronic interactions between the metal and the nitrate group, as shown in Figure 9c.…”
Section: Fundamentals Of Solution‐based Metal Oxide Rramsmentioning
confidence: 99%
“…It constitutes a substantial portion of the oxide precursor solutions: around 98% and 90% for lower and higher concentrations, respectively. The most common solvents in solution‐based metal oxide RRAMs are 2‐methoxyethanol (2‐ME), [ 63,72,79,80,98,102,104,105,107,109,112,113,115–119,121,127,129,130,133,134,137,139,142,144,150–153,158,159,168–185 ] ethanol, [ 72,77,78,82,103,108,113,114,120,126,132,135,136,138,145,147,157,162–164,168,186–200 ] deionized (DI) water, [ 73,101,116,120,123,148,162,163,190,201 ] acetic acid, [ 103,121,129–131,134,140,142,144,149,150,152,154,173,179,180,183,202 ] and isopropanol [ 23,123,125,128,136,169,181,203 ] among others (ethylene glycol, [ 141,204 ] 2‐butoxyethanol, [ 205 ] acetylacetone, [ 149 ] and acetonitrile […”
Section: Fundamentals Of Solution‐based Metal Oxide Rramsmentioning
confidence: 99%
“…The solvent used for the sol-gel process must exhibit a dielectric constant high enough to dissolve the metal salts. Generally, alcohols with low carbon number (i.e., methyl alcohol, ethyl alcohol, isopropanol, 1-butanol, and 2-methoxyethanol) are preferred as the potential solvents [29][30][31][32] and references therein. Ethylene glycol (boiling point; b.pt = 194.4 o C) has also been reported exhibiting a dielectric constant of 40.61 (at 25 o C) [33,34].…”
Section: Processingmentioning
confidence: 99%
“…It is known that thin films properties and morphology can be affected by postprocessing annealing temperature, which has been the subject of several works. In the case of the sol-gel spin coating technique, the morphology and properties of the film are also impacted by processing parameters such as the chelating agent [36,37], the zinc salt concentration [38][39][40], the solvent [41][42][43][44][45], the rotation speed [46][47][48][49][50][51][52][53][54][55][56][57] and the nature of the substrate [58][59][60][61][62][63]. In the present study, spin coating, which is usually devoted to the spreading of viscous solutions, is used in an uncommon configuration of fluid liquid deposition, giving rise to very thin films (<100 nm) with peculiar nano-granular morphologies.…”
Section: Introductionmentioning
confidence: 99%