ISAF '96. Proceedings of the Tenth IEEE International Symposium on Applications of Ferroelectrics
DOI: 10.1109/isaf.1996.598059
|View full text |Cite
|
Sign up to set email alerts
|

Sol-gel deposition of PZT thin films on ceramic ZrO/sub 2/ substrates

Abstract: Pb(Zr 1-x Ti x )O 3 thin films (x = 0.55 and 0.85) were prepared on fine grained, polished ZrO 2 ceramic substrates by a sol-gel method. The high thermal expansion of ZrO 2 relative to Si allows the preparation of thicker PZT films with reduced thermal stress. For the x = 0.85 films, this reduction of thermal stress gives a preference of (001) over (100) oriented domains. For x = 0.55 films, square P-E hysteresis loops were obtained with: P r = 36 µC/cm 2 , and E c = 45 kV/cm, at a field of 160 kV/cm. Pyroelec… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3

Citation Types

0
3
0

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 5 publications
(3 citation statements)
references
References 12 publications
(9 reference statements)
0
3
0
Order By: Relevance
“…Buffer layers are frequently introduced in ferroelectric thin films, including lead zirconate titanate (PZT), to control film nucleation, growth rate, 9 and film orientations to achieve improved properties and microstructures, 10 or to minimize the interface reactions and corresponding deterioration in ferroelectric properties 11 . For ferroelectric PZT thin films, both insulating buffer materials such as PbTiO 3 , 9 TiO 2 , 10,11 zirconia (ZrO 2 ), 12–18 and conducting LaNiO 3 19,20 have been investigated. Among buffer candidates, ZrO 2 is low cost and is well known to have reasonable mechanical strength, chemical durability, alkali resistance, and refractoriness 21,22 .…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Buffer layers are frequently introduced in ferroelectric thin films, including lead zirconate titanate (PZT), to control film nucleation, growth rate, 9 and film orientations to achieve improved properties and microstructures, 10 or to minimize the interface reactions and corresponding deterioration in ferroelectric properties 11 . For ferroelectric PZT thin films, both insulating buffer materials such as PbTiO 3 , 9 TiO 2 , 10,11 zirconia (ZrO 2 ), 12–18 and conducting LaNiO 3 19,20 have been investigated. Among buffer candidates, ZrO 2 is low cost and is well known to have reasonable mechanical strength, chemical durability, alkali resistance, and refractoriness 21,22 .…”
Section: Introductionmentioning
confidence: 99%
“…Among buffer candidates, ZrO 2 is low cost and is well known to have reasonable mechanical strength, chemical durability, alkali resistance, and refractoriness 21,22 . However, for most of the previous papers, the ZrO 2 buffer layer is either located underneath the bottom electrode 12 or is used as a passivation layer 13–16 for Si and/or SiO 2 , and only limited publications have investigated the effect of the ZrO 2 buffer between PZT thin films and noble metal electrodes 17,18 …”
Section: Introductionmentioning
confidence: 99%
“…The ferroelectric and piezoelectric properties of sol-gel PZT films with different textures have been reported by various research groups [4,5,6]. Because the studies on the electrical properties of differently textured PZT films were carried out on different substrates and under different processing conditions, a systematic comparison of the properties of PZT films as a function of orientation is still missing.…”
Section: Introductionmentioning
confidence: 99%