“…Buffer layers are frequently introduced in ferroelectric thin films, including lead zirconate titanate (PZT), to control film nucleation, growth rate, 9 and film orientations to achieve improved properties and microstructures, 10 or to minimize the interface reactions and corresponding deterioration in ferroelectric properties 11 . For ferroelectric PZT thin films, both insulating buffer materials such as PbTiO 3 , 9 TiO 2 , 10,11 zirconia (ZrO 2 ), 12–18 and conducting LaNiO 3 19,20 have been investigated. Among buffer candidates, ZrO 2 is low cost and is well known to have reasonable mechanical strength, chemical durability, alkali resistance, and refractoriness 21,22 .…”