2017 IEEE International Electron Devices Meeting (IEDM) 2017
DOI: 10.1109/iedm.2017.8268401
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SOI monolithic pixel technology for radiation image sensor

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Cited by 6 publications
(3 citation statements)
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“…The active merge technique can reduce the circuit area, for example, the area of a standard D-type flip-flop becomes 16.5% [14]. The SOI is tolerant against neutrons and single event upset.…”
Section: Soi Technologymentioning
confidence: 99%
See 1 more Smart Citation
“…The active merge technique can reduce the circuit area, for example, the area of a standard D-type flip-flop becomes 16.5% [14]. The SOI is tolerant against neutrons and single event upset.…”
Section: Soi Technologymentioning
confidence: 99%
“…Large-surface-area detector panels of about 3.1-cm thickness are sandwiched in the gaps between the steel plates of the solenoid's magnetic-field flux return. Each panel contains either RPCs (barrel layers [3][4][5][6][7][8][9][10][11][12][13][14][15] or scintillator strips (barrel layers 1-2, forward-endcap layers 1-14 and backward-endcap layers 1-12). The RPC cathode readout strips are about 4 cm wide and each scintillator strip is 4 cm wide, measured orthogonal to a line from the SuperKEKB e + e − collider's interaction point (IP); this matches the Molière radius of muons originating at the interaction point and traversing the electromagnetic calorimeter located just inside the solenoid.…”
Section: Klm Geometry and Instrumentationmentioning
confidence: 99%
“…Evaluation of the X-CHIP-02 [1] detection capabilities and its performance in irradiation tests showed that the SOI CMOS technology is promising not only in the field of soft X-ray imaging, but also in charged particle detection [2]. The X-CHIP-03 [3] is an evolution of the X-CHIP-02 design, with slightly larger pixels, inter-pixel and global architecture improvements and an additional functionality of signal amplitude measurement.…”
Section: Introductionmentioning
confidence: 99%