2015
DOI: 10.1088/0957-4484/26/48/484002
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Soft-mask fabrication of gallium arsenide nanomembranes for integrated quantum photonics

Abstract: Abstract. We report on the fabrication of quantum photonic integrated circuits based on suspended GaAs membranes. The fabrication process consists of a single lithographic step followed by inductively-coupled-plasma dry etching through an electron-beam-resist mask and wet etching of a sacrificial layer. This method does not require depositing, etching, and stripping a hard mask, greatly reducing fabrication time and costs, while at the same time yielding devices of excellent structural quality. We discuss in d… Show more

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Cited by 49 publications
(60 citation statements)
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“…Fifth, the membrane should be thinner than ∼250 nm to ensure single-mode behavior in waveguide structures. In fact, the fabrication of such nanostructures with a soft-mask technique sets a slightly stronger constraint: 180 nm is the maximum membrane thickness which can be processed with vertical sidewalls [24]. Sixth, the quantum dots must be located close to the center of the diode structure to maximize the coupling to TE-like photonic modes [13].…”
Section: P-i-n-i-n Quantum Dot Heterostructurementioning
confidence: 99%
See 1 more Smart Citation
“…Fifth, the membrane should be thinner than ∼250 nm to ensure single-mode behavior in waveguide structures. In fact, the fabrication of such nanostructures with a soft-mask technique sets a slightly stronger constraint: 180 nm is the maximum membrane thickness which can be processed with vertical sidewalls [24]. Sixth, the quantum dots must be located close to the center of the diode structure to maximize the coupling to TE-like photonic modes [13].…”
Section: P-i-n-i-n Quantum Dot Heterostructurementioning
confidence: 99%
“…The diode itself is grown on top of a 1371-nm-thick Al 0.75 Ga 0. 25 As sacrificial layer which enables fabrication of free standing membranes via selective wet etching [24]. The first part of the active layer is a 12.5-nm-thick layer of intrinsic GaAs [no.…”
Section: (C)mentioning
confidence: 99%
“…A mesa structure is defined by standard optical lithography and wet etching, and connected through the bottom n-type and top p-type ohmic contacts. The sample biased at a constant electric field of around 100 kV/cm [41]. The central part of the nanostructure consists of a so-called slow-light waveguide section, the white-shaded region in Fig.…”
mentioning
confidence: 99%
“…However, the fabrication process requires a low‐index substrate (silica), which can physically support the polymer structure without introducing additional loss. Planar GaAs devices with deterministic photon–emitter coupling, on the contrary, are fabricated on a high‐index sacrificial layer (Al x Ga1xAs) which is subsequently removed to form suspended waveguides . A cladded inverted taper for this platform has not yet been demonstrated.…”
Section: Introductionmentioning
confidence: 99%
“…Figure b). The GaAs waveguide circuit is fabricated by means of electron beam (e‐beam) lithography, followed by dry and wet etching . The tapers are patterned on a 200‐nm‐thick CSAR 9 positive e‐beam resist.…”
Section: Introductionmentioning
confidence: 99%