Atomically
thin two-dimensional (2D) materials have gained significant
attention from the research community in the fabrication of high-performance
optoelectronic devices. Even though there are various techniques to
improve the responsivity of the photodetector, the key factor limiting
the performance of the photodetectors is constrained photodetection
spectral range in the electromagnetic spectrum. In this work, a mixed-dimensional
0D/2D SnS2-QDs/monolayer MoS2 hybrid is fabricated
for high-performance and broadband (UV–visible–near-infrared
(NIR)) photodetector. Monolayer MoS2 is deposited on SiO2/Si using chemical vapor deposition (CVD), and SnS2-QDs are prepared using a low-cost solution-processing method. The
high performance of the fabricated 0D/2D photodetector is ascribed
to the band bending and built-in potential created at the junction
of SnS2-QDs and MoS2, which enhances the injection
and separation efficiency of the photoexcited charge carriers. The
mixed-dimensional structure also suppresses the dark current of the
photodetector. The decorated SnS2-QDs on monolayer MoS2 not only improve the performance of the device but also extends
the spectral range to the UV region. Photoresponsivity of the device
for UV, visible, and NIR region is found to be ∼278, ∼
435, and ∼189 A/W, respectively. Fabricated devices showed
maximum responsivity under the visible region attributed to the high
absorbance of monolayer MoS2. The response time of the
fabricated device is measured as ∼100 ms. These results reveal
that the development of a mixed-dimensional (0D/2D) SnS2-QDs/MoS2-based high-performance and broadband photodetector
is technologically promising for next-generation optoelectronic applications.