1996
DOI: 10.1016/0042-207x(96)00133-9
|View full text |Cite
|
Sign up to set email alerts
|

Small pulsed electron-ion sources for radiation technologies and surface modification of materials

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
4
0

Year Published

1997
1997
2011
2011

Publication Types

Select...
4
1

Relationship

0
5

Authors

Journals

citations
Cited by 9 publications
(4 citation statements)
references
References 3 publications
0
4
0
Order By: Relevance
“…Korenev et al demonstrated the design and development of pulsed low-energy electron sources for material modification applications [44]. New designs aimed at industrial scale material modification technologies are required.…”
Section: Rtp Processing Using Electron Beamsmentioning
confidence: 99%
See 2 more Smart Citations
“…Korenev et al demonstrated the design and development of pulsed low-energy electron sources for material modification applications [44]. New designs aimed at industrial scale material modification technologies are required.…”
Section: Rtp Processing Using Electron Beamsmentioning
confidence: 99%
“…New designs aimed at industrial scale material modification technologies are required. Pulsed electron beams for this technology must have a large cross section and good current density uniformity [44].…”
Section: Rtp Processing Using Electron Beamsmentioning
confidence: 99%
See 1 more Smart Citation
“…[35,36] Intermediate in energy between the metal ion sources and the high intensity pulsed ion and electron beams-operating ranges of the main parameters of the source are given in Table IV-this system allows the generation of either type of beam through a simple polarity reversal. [35,36] Intermediate in energy between the metal ion sources and the high intensity pulsed ion and electron beams-operating ranges of the main parameters of the source are given in Table IV-this system allows the generation of either type of beam through a simple polarity reversal.…”
Section: A Small Scale Ion And/or Electron Sourcementioning
confidence: 99%