2005
DOI: 10.1103/physrevb.72.115101
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Small polaron hopping in spinel manganates

Abstract: Additional information:Use policyThe full-text may be used and/or reproduced, and given to third parties in any format or medium, without prior permission or charge, for personal research or study, educational, or not-for-pro t purposes provided that:• a full bibliographic reference is made to the original source • a link is made to the metadata record in DRO • the full-text is not changed in any way The full-text must not be sold in any format or medium without the formal permission of the copyright holders.P… Show more

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Cited by 149 publications
(88 citation statements)
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“…The p and g(0.15 eV) values of the annealed films are in good agreement with bulk NiMn 2 O 4 values reported previously. 36 In contrast, the as-deposited films show a lower density of localized electron states contributing to the hopping process. Obviously, annealing and concomitantly improved film crystallization bring the charge transport properties of AD films closer to the bulk behavior.…”
Section: B Ntc Thermistor Behavior Of the DC Film Resistivitymentioning
confidence: 90%
See 1 more Smart Citation
“…The p and g(0.15 eV) values of the annealed films are in good agreement with bulk NiMn 2 O 4 values reported previously. 36 In contrast, the as-deposited films show a lower density of localized electron states contributing to the hopping process. Obviously, annealing and concomitantly improved film crystallization bring the charge transport properties of AD films closer to the bulk behavior.…”
Section: B Ntc Thermistor Behavior Of the DC Film Resistivitymentioning
confidence: 90%
“…A temperature dependent activation energy for electron hopping was found many decades ago, 1 but only more recently has a theoretically justified small polaron variable-range hopping (VRH) model been employed more frequently. [32][33][34][35][36] In this work, we present a detailed in-plane impedance spectroscopy (IS) study on approximately 2 lm thick NMO films produced via the aerosol deposition (AD) technique using glass and Al 2 O 3 substrates. 28 The recently developed AD technique offers several distinct advantages: it allows highly dense polycrystalline films of sub-micrometer grain size to be produced with a high deposition rate and without an additional sintering densification process.…”
mentioning
confidence: 99%
“…͑5a͒ and ͑5b͔͒. 43,44 By using an estimated value for the localization length a =1/ ␣ of electrons participating to the hopping transport, for example, from the cationic radius of 0.6 Å for Co 3+ ͑based on an ionic model neglecting the covalent character of the bonds͒, 45 the DES near Fermi level N͑ F ͒ and r max at 50 K were calculated according to expressions ͑5a͒ and ͑5b͒. 43,44 The values are shown in Table I,…”
Section: Resultsmentioning
confidence: 99%
“…Although only few data points are available here to suggest VRH charge transport to occur, possibly between defect Mn 2+ and Mn 3+ cations, it should be noted that the T dependence of charge transport in mixed valence manganitehopping systems commonly follows VRH laws. 59,60 A linear least-squares routine was employed to fit the Arrhenius ln(ρ 1 ) vs 1/T curve to Eq. (2) for T T C .…”
Section: Equivalent Circuit-fitting Parameters Of Bmo and Bfo Filmsmentioning
confidence: 99%