Slow crossover in<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi mathvariant="normal">Yb</mml:mi><mml:mi>X</mml:mi><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Cu</mml:mi></mml:mrow><mml:mrow><mml:mn>4</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>(<b><i>X</i></b>=Ag, Cd, In, Mg, Tl, Zn) intermediate-valence compounds

Lawrence, J. M.; Riseborough, Peter S.; Booth, C. H.; Sarrao, J. L.; Thompson, J. D.; Osborn, R.

doi:10.1103/physrevb.63.054427

Cited by 82 publications

(64 citation statements)

References 32 publications

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“…31 These absolute error estimates are similar to (though always larger than) those obtained by other methods such as a Monte Carlo method 33 or the relative errors estimated from the number of scans taken at a given temperature for all the measurements report here.…”

Section: Methodssupporting

confidence: 70%

Effects of lattice disorder in theUCu5−xPdxsystem

et al. 2002

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The UCu5−xPdx system exhibits non-Fermi liquid (NFL) behavior in thermodynamic and transport properties at low temperatures for Pd concentrations 0.9 < ∼ x < ∼ 1.5. The local structure around the U, Cu, and Pd atoms has been measured for 0 ≤ x ≤ 1.5 using the x-ray absorption fine structure (XAFS) technique in order to quantify the effects of lattice disorder on the NFL properties. A model which allows a percentage of the Pd atoms to occupy nominal Cu (16e) sites, s, was used to fit the Pd and Cu K edge and U LIII edge data. Pd/Cu site interchange was found to occur in all samples (x = 0), reaching a minimum value of s ∼ 0.17 at x = 0.7 and increasing monotonically to s ≃ 0.4 at x = 1.5. These data also determine an upper limit on the static disorder of the nearest neighbor U-Cu pairs. A single-ion Kondo disorder model with a lattice-disorder origin of the distribution of f /conduction electron hybridization strengths within a tight-binding approach is used to calculate magnetic susceptibility. The results indicate that the measured U-Cu static disorder is not sufficient to explain the NFL behavior of the magnetic susceptibility within this variant of the Kondo disorder model, suggesting either that other sources of Kondo disorder exist or that the Kondo disorder model is not applicable to UCu5−xPdx.

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Section: Methodssupporting

confidence: 70%

Effects of lattice disorder in theUCu5−xPdxsystem

et al. 2002

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“…37 The results of such fits are shown in Figure 6, and repeated for the data from Cp * 2 Yb(4,4 ′ -Me 2 -bipy)…”

Section: X-ray Absorptionmentioning

confidence: 99%

Intermediate-Valence Tautomerism in Decamethylytterbocene Complexes of Methyl-Substituted Bipyridines

et al. 2010

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“…We have confirmed this limit with a more detailed NCA calculation. 57 For smaller T nca , this limit would be even more restrictive. Therefore, the main conclusion of this qualitative discussion is simply that charge fluctuations dominate the interpretation of the RXES data.…”

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confidence: 99%

Probing5f-state configurations inURu2Si2with ULIII-edge reso

Booth¹,

Medling²,

Tobin³

et al. 2016

Phys. Rev. B

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Resonant x-ray emission spectroscopy (RXES) was employed at the U LIII absorption edge and the Lα1 emission line to explore the 5f occupancy, n f , and the degree of 5f orbital delocalization in the hidden order compound URu2Si2. By comparing to suitable reference materials such as UF4, UCd11, and α-U, we conclude that the 5f orbital in URu2Si2 is at least partially delocalized with n f = 2.87 ± 0.08, and does not change with temperature down to 10 K within the estimated error. These results place further constraints on theoretical explanations of the hidden order, especially those requiring a localized f 2 ground state.

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Slow crossover inYbXCu4(X=Ag, Cd, In, Mg, Tl, Zn) intermediate-valence compounds

Cited by 82 publications

References 32 publications

Effects of lattice disorder in theUCu5−xPdxsystem

Effects of lattice disorder in theUCu5−xPdxsystem

Intermediate-Valence Tautomerism in Decamethylytterbocene Complexes of Methyl-Substituted Bipyridines

Probing5f-state configurations inURu2Si2with ULIII-edge reso

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