2017
DOI: 10.1186/s11671-017-2176-8
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Sliding Speed-Dependent Tribochemical Wear of Oxide-Free Silicon

Abstract: Fundamental understanding of tribochemical wear mechanism of oxide-free single crystalline silicon (without native oxide layer) is essential to optimize the process of ultra-precision surface manufacturing. Here, we report sliding speed-dependent nanowear of oxide-free silicon against SiO2 microspheres in air and in deionized water. When contact pressure is too low to induce Si yield, tribochemical wear occurs with the existence of water molecules and wear volume decreases logarithmically to constant as slidin… Show more

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Cited by 21 publications
(17 citation statements)
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“…Over the same range of the sliding speed, the maximum wear depth (total wear volume) decreases from 0.58 μm (3.28 × 10 −4 mm 3 ) to 0.19 μm (1.36 × 10 −4 mm 3 ) in pH 10 and from 0.67 μm (3.52 × 10 −4 mm 3 ) to 0.23 μm (1.46 × 10 −4 mm 3 ) in pH 13. This speed dependence of wear of SLS glass in different pH conditions (7, 10, and 13) is qualitatively similar to the effect of sliding speed on tribochemical wear of Si, Si 3 N 4 , GaAs, and RB‐SiC ceramics 38‐41 . The contribution of the friction‐induced local temperature rise at the sliding interface would be negligible, because the liquid water can act as a coolant removing frictional heat from the interface 42 …”
Section: Resultssupporting
confidence: 63%
See 1 more Smart Citation
“…Over the same range of the sliding speed, the maximum wear depth (total wear volume) decreases from 0.58 μm (3.28 × 10 −4 mm 3 ) to 0.19 μm (1.36 × 10 −4 mm 3 ) in pH 10 and from 0.67 μm (3.52 × 10 −4 mm 3 ) to 0.23 μm (1.46 × 10 −4 mm 3 ) in pH 13. This speed dependence of wear of SLS glass in different pH conditions (7, 10, and 13) is qualitatively similar to the effect of sliding speed on tribochemical wear of Si, Si 3 N 4 , GaAs, and RB‐SiC ceramics 38‐41 . The contribution of the friction‐induced local temperature rise at the sliding interface would be negligible, because the liquid water can act as a coolant removing frictional heat from the interface 42 …”
Section: Resultssupporting
confidence: 63%
“…This speed dependence of wear of SLS glass in different pH conditions (7, 10, and 13) is qualitatively similar to the effect of sliding speed on tribochemical wear of Si, Si 3 N 4 , GaAs, and RB-SiC ceramics. [38][39][40][41] The contribution of the friction-induced local temperature rise at the sliding interface would be negligible, because the liquid water can act as a coolant removing frictional heat from the interface. 42 Note that the wear depth of SLS glass in the aqueous solution is much smaller than that in dry air condition, 9 and the surface topography of SLS glass is much smoother (Figure 2A-C).…”
Section: Corrosion-wear Behaviors Of Sls Glass In Water and Basic Smentioning
confidence: 99%
“…A similar relationship between the tribochemical wear rate and sliding speed was also reported in Refs. [151,152].…”
Section: Tribochemical Wear Facilitated By Interfacial Ice-like Watermentioning
confidence: 99%
“…If the molecules adsorbed from the vapor phase are water, then tribochemical reactions can lead to the wear of solid surfaces. Through model studies under well-controlled relative humidity (RH) conditions on silicon and silicon oxide surfaces, it was proposed that the formation of covalent bonds bridging the reactive sites of the two solid surfaces shearing relative to each other can facilitate such tribochemical wear . On hydroxylated silicon oxide surfaces, dehydroxylation reactions involving the Si–OH groups at the substrate and counter surfaces can lead to the formation of the Si substrate –O–Si counter_surface . , The impact of the formation of such interfacial bridging bonds is highly dependent on the surface chemistry and RH as well as the contact pressure and sliding speed during shear . Although tribochemical wear due to adsorbed water molecules is undesirable in most tribological interfaces, it has been suggested that it could be used as a new nanofabrication method for the chemical-free and mask-free etching of arbitrary shapes on silicon surfaces with an atomic-level depth resolution …”
Section: Introductionmentioning
confidence: 99%