2011
DOI: 10.1021/nl2020153
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Size- and Temperature-Dependent Charge Transport in PbSe Nanocrystal Thin Films

Abstract: We report the size- and temperature-dependence of electron transport in thin films of PbSe nanocrystals. Upon increasing temperature over the range 28-200 K, the electron transport underwent a transition in mechanism from Efros-Shklovskii-variable-range-hopping (ES-VRH) to nearest-neighbor-hopping (NNH). The transition occurred at higher temperatures for films with smaller particles. The electron localization length, estimated from the ES-VRH model, was comparable to the nanocrystal size and scaled systematica… Show more

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Cited by 116 publications
(180 citation statements)
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“…43,44 The transients are also thermally activated (Supporting Information Figures S5 and S6). Activated I D transients in PbX QD FETs have been observed by others and attributed to a barrier to trapping, 42 thermally activated ligand rearrangements, 43 or QD motion. Below ∼150 K, the transients were greatly suppressed for FETs without ALD and often completely eliminated for infilled FETs.…”
mentioning
confidence: 63%
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“…43,44 The transients are also thermally activated (Supporting Information Figures S5 and S6). Activated I D transients in PbX QD FETs have been observed by others and attributed to a barrier to trapping, 42 thermally activated ligand rearrangements, 43 or QD motion. Below ∼150 K, the transients were greatly suppressed for FETs without ALD and often completely eliminated for infilled FETs.…”
mentioning
confidence: 63%
“…The hole mobility increases by about a factor of 4 over the same range of sweep rate, which is caused by persistent I D transients for holes, even at low temperatures. 42,43 Together, these control experiments firmly establish that the change in dominant carrier type and mobility is a consequence of alumina infilling of the sulfide-capped QD films; that is, it is a property of the PbSe/Al 2 O 3 nanocomposite film itself, rather than a result of modifications to the gate dielectric, film heating, film annealing, or artifacts stemming from time-dependent drain currents.…”
mentioning
confidence: 73%
“…Transport through a QDS is determined by the interplay between electronic coupling and the activation energy for interparticle hopping. 19 We consider three explanations for the greater hole mobilities observed for MeO À capping vs EDT capping: (1) a decrease of the activation energy due to an increase of the effective static dielectric constant of the ligand matrix, (2) an increase of electronic coupling, and (3) a smaller surface trap state density.…”
Section: Discussionmentioning
confidence: 99%
“…Assuming the same static dielectric constant of the ligand (ε L ), we calculate comparable values for the charging energy of EDT-and MeO À -capped particles, despite the differences in interparticle spacing (2À3 vs 5 Å). 19 In contrast, large differences in E C are observed when changing the static dielectric constant. For a 5.7 nm PbSe particle for instance, E C decreases from 9.3 meV to 2.1 meV upon changing ε L from 2.6 (as in Pb(EDT) 2 capping) to 10.…”
mentioning
confidence: 97%
“…is usually seen to be positive with values around 0.25 (Mott variable-range hopping), 0.5 (Efros Shklovskii variable-range hopping) or 1.0 (Arrhenius-like nearest neighbor hopping) [15]. For this reason, a negative is often taken as an unambiguous sign for the occurrence of band-like transport.…”
Section: Temperature-dependent Carrier Mobilitymentioning
confidence: 99%