Site-specific adsorption of metallic and biological nanoparticles on nanostructured silicon surfaces

Skorupska, Katarzyna

doi:10.1007/s10008-008-0687-z

Cited by 15 publications

(25 citation statements)

References 46 publications

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“…Similar observations have been made for Pt deposition on H-terminated and electrochemically step-bunched Si surfaces. [23] After deposition on p-type silicon, the surface appears almost completely covered with a particulate film characterized by a mean particle diameter of 100 nm and an average height of 30 nm.…”

Section: Photoelectrodeposition Of Rh Onto H-terminated Si(111)mentioning

confidence: 99%

“…[23] It consists of terraces of 200 nm width in average and a height of several atomic bilayers (one bilayer = 0.314 nm). Synchrotron radiation photoelectron spectroscopy (SRPES) performed on this type of surfaces allows one to establish the valence band onset at 1.06 eV.…”

Section: Electrodeposition Of Reverse Transcriptases Ontomentioning

confidence: 99%

“…The charge excess is predominantly located at and near step edges as inferred from contact potential difference profiles obtained by AFM Kelvin probe experiments. [23] For biosensing applications, mesoscopic enzymes have been deposited onto such step-bunched surfaces. The chosen enzymes are of medical relevance as biocatalysts for retroviral DNA from a viral RNA strand.…”

Section: Electrodeposition Of Reverse Transcriptases Ontomentioning

confidence: 99%

“…The scan was started at open circuit potential and stopped for 40 s when the current density reached 100 mA. [23] As biomolecules, the enzyme reverse transcriptase (RT) of the avian myeloblastosis virus (AMV) was used. It was delivered by Sigma as a solution of pH7.2 containing 50 % glycerol, 200 mm potassium phosphate, 2 mm dithiothreitol and 0.2 % Triton X-100.…”

Section: Summary and Future Directionsmentioning

confidence: 99%

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Fundamental Aspects of Electrodeposition for the Realization of Plasmonic Nanostructures

Muñoz¹,

Skorupska²,

Lewerenz³

2010

ChemPhysChem

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Electrodeposition is used for the preparation of nanoparticles and nanostructures that allow, in principle, surface plasmon excitation. The (photo)electrodeposition process of Rh and Au nanoparticles as well as of heterodimeric enzymes onto silicon surfaces is investigated and the resulting structures are discussed with regard to applications in photoelectroctalysis and biosensing. Electrodeposition of Rh onto H-terminated p-Si surfaces generates nanostructures of the metal nanoparticles with simultaneous oxidation of the substrate thus forming nano-dimensioned metal-oxide-semiconductor (MOS)-type contacts. The excess minority carrier harvesting in these nanoemitter structures, where semispherical space charge layers underneath the metal exist are discussed based on spectral sensitivity and capacitance measurements The deposition of Au nanoparticles by a combined chemical-electrochemical method on Si is presented as an example for sensing actuators where the resonance frequency is changed by adsorption. Similarly, site-selective deposition of the enzyme reverse transcriptase onto nanostructured (step-bunched) silicon serves as precursor experiment for biosensing in a Kretschmann-type ATR configuration. Future applications based on plasmonically active structures are outlined.

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Section: Photoelectrodeposition Of Rh Onto H-terminated Si(111)mentioning

confidence: 99%

Section: Electrodeposition Of Reverse Transcriptases Ontomentioning

confidence: 99%

Section: Electrodeposition Of Reverse Transcriptases Ontomentioning

confidence: 99%

Section: Summary and Future Directionsmentioning

confidence: 99%

See 2 more Smart Citations

Fundamental Aspects of Electrodeposition for the Realization of Plasmonic Nanostructures

Muñoz¹,

Skorupska²,

Lewerenz³

2010

ChemPhysChem

Self Cite

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“…During the last years, the number of such contributions tends to increase, reflecting a growing interest on the electrochemical methods and appliances. For example, during 2009-2010, a series of reviews were presented on the electrochemical techniques for the conservation and monitoring of archeological heritage [1][2][3], polarization resistance approach for the corrosion studies [4], selected conceptual aspects in the developments of electrochemical sensors [5][6][7][8][9], (photo)electrochemical preparation and characterization of nanostructures on silicon surfaces [10][11][12], methods for evaluation and improvement of metal hydride electrodes [13], key theoretical issues and modeling principles of the electron transfer reactions [14], and design of hybrid materials [15] and electrodes of lithium batteries and solid oxide fuel cells [16][17][18]. These and other emerging topics will also be addressed in numerous works planned for publication in 2011-2012.…”

mentioning

confidence: 99%

Methodological aspects of electrochemical science and technology: a selection of reviews

Хартон

Aurbach

2011

J Solid State Electrochem

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Solid-state electrochemistry is a rapidly developing scientific field that integrates many aspects of the classical electrochemical science and engineering, solid-state chemistry and physics, materials science, heterogeneous catalysis, and other areas of physical chemistry. This field comprises, but is not limited to, electrochemistry of solid materials, thermodynamics and kinetics of electrochemical reactions involving at least one solid phase, transport of ions and electrons in solids and interactions between solid, liquid, and/or gaseous phases whenever these processes are essentially determined by properties of solids and are relevant to the electrochemical reactions, and a variety of practical applications using solid electrolytes, mixed ionicelectronic conductors, and solid-state electrochemical reactions. The range of these applications includes many types of batteries, fuel cells, capacitors and accumulators, numerous sensors and analytical appliances, electrochemical gas pumps and compressors, electrochromic and memory devices, ceramic membranes with ionic or mixed ionic-electronic conductivity, solid-state electrolyzers and electrocatalytic reactors, synthesis of new materials with improved properties, and corrosion protection. The first fundamental discoveries considered now as the foundation of solid-state electrochemistry were made in the nineteenth and first half of the twentieth centuries by M. Faraday, E. Warburg, W. Nernst, C. Tubandt, W. Schottky, C. Wagner, and other famous scientists. Their works provided background for the fast progress achieved both in the understanding of the solid-state electrochemical processes and in the applied developments during the second half of the twentieth century. Apart from the fundamental electrochemical phenomena, many experimental methods and theoretical approaches elaborated in the classical works are used in solid-state electrochemistry up to now, in combination with advanced technological and scientific facilities and, often, novel concepts and models.As for any other area, the progress in solid-state electrochemistry leads both to new horizons and to new challenges. In particular, the increasing demands for higher performance of the electrochemical devices lead to the necessity to develop novel approaches for the nanometerscale optimization of materials and interfaces, for analysis and modeling of highly non-ideal systems, and for overcoming numerous gaps in knowledge, which became only possible due to recent achievements in the related areas of science and technology. As for technological implementation of experimental and theoretical concepts extending from the nano to macro levels, continuous efforts are always necessary to introduce state-of-the-art electrochemical techniques to the closely related scientific areas and to adopt their advanced methods to study electrochemical systems. Moreover, the rising amount and diversity of available scientific information during the last decades increase the importance of systematization, verification, unificat...

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Epitaxial III–V Films and Surfaces for Photoelectrocatalysis

et al. 2012

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Efficient photoelectrochemical devices for water splitting benefit from the highest material quality and dedicated surface preparation achieved by epitaxial growth. InP(100)-based half-cells show significant solar-to-hydrogen efficiencies, but require a bias due to insufficient voltage. Tandem absorber structures may provide both adequate potential and efficient utilization of the solar spectrum. We propose epitaxial dilute nitride GaPNAs photocathodes on Si(100) substrates to combine close-to-optimum limiting efficiency, lattice-matched growth, and established surface preparation. Prior to a discussion of the challenging III-V/Si(100) heterojunction, we describe the closely related epitaxial preparation of InP(100) surfaces and its beneficial impact on photoelectrochemical water-splitting performance. Analogies and specific differences to GaP(100) surfaces are discussed based on in situ reflectance anisotropy and on two-photon photoemission results. Preliminary experiments regarding GaP/Si(100) photoelectrochemistry and dilute nitride GaPN heteroepitaxy on Si(100) confirm the potential of the GaPNAs/Si tandem absorber structure for future water-splitting devices.

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Site-specific adsorption of metallic and biological nanoparticles on nanostructured silicon surfaces

Cited by 15 publications

References 46 publications

Fundamental Aspects of Electrodeposition for the Realization of Plasmonic Nanostructures

Fundamental Aspects of Electrodeposition for the Realization of Plasmonic Nanostructures

Methodological aspects of electrochemical science and technology: a selection of reviews

Epitaxial III–V Films and Surfaces for Photoelectrocatalysis

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