1996
DOI: 10.1103/physrevlett.77.1087
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Site Exchange of Ge and Sb on Si(100) during Surfactant-Mediated Epitaxial Growth

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Cited by 45 publications
(19 citation statements)
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“…[1][2][3][4][5] In an effort to understand the role of such adsorbates, several experimental [6][7][8][9] and theoretical 10 studies of Sb adsorption on Si͑001͒ have already appeared in the literature. The general conclusions of these studies is that the deposition of a ML of Sb over a range of substrate temperatures lifts the wellknown Si(001)-(2ϫ1) asymmetric dimer reconstruction and forms a (2ϫ1) structure of symmetric Sb-Sb dimers on top of near bulklike silicon.…”
mentioning
confidence: 99%
“…[1][2][3][4][5] In an effort to understand the role of such adsorbates, several experimental [6][7][8][9] and theoretical 10 studies of Sb adsorption on Si͑001͒ have already appeared in the literature. The general conclusions of these studies is that the deposition of a ML of Sb over a range of substrate temperatures lifts the wellknown Si(001)-(2ϫ1) asymmetric dimer reconstruction and forms a (2ϫ1) structure of symmetric Sb-Sb dimers on top of near bulklike silicon.…”
mentioning
confidence: 99%
“…Of these dopants, Sb is the most commonly used and has a lower surface segregation than P and As. The interaction of Sb with the silicon surface is a subject of great interest and much debate, and has been widely studied for growth of germanium and Si x Ge 1Àx as well as silicon [7][8][9][10]. At moderate temperatures, Sb acts as a surfactant and at low temperatures, Sb can be incorporated as an n-type dopant.…”
Section: Introductionmentioning
confidence: 99%
“…Adsorption of antimony and arsenic on silicon surfaces has been the subject of great interest theoretically and experimentally because of their importance both as dopants and surfactants [1][2][3]. Due to their similar electronic structure, both of them exhibit 2 Â 1 symmetric dimer reconstruction at monolayer coverage adsorption on Si(0 0 1).…”
Section: Introductionmentioning
confidence: 99%