Site-Controlled Deposition of Microsized Particles Using an Electrostatic Assembly

Fudouzi, Hiroshi; Kobayashi, Mikihiko; Shinya, Norio

doi:10.1002/1521-4095(20021118)14:22<1649::aid-adma1649>3.0.co;2-z

Cited by 62 publications

(54 citation statements)

References 8 publications

(13 reference statements)

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“…[7][8][9][10][11][12] Recently, electrostatic-force-based assembly of nanoparticles has been proposed as a general, precise, and reliable methodology for such purposes. [13][14][15][16][17][18][19][20][21][22] In the most direct type of electrostatic-force-based assembly, charge patterns are created by scanning-probe or microcontact charging techniques onto electret materials via electron-or hole-tunneling processes. [16][17][18][19][20] As the electret materials can retain electric charge or polarization for a long time, these charge patterns can be used as templates for assembling charged or polarizable nanoparticles.…”

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confidence: 99%

Templated Self‐Assembly of Colloidal Nanoparticles Controlled by Electrostatic Nanopatterning on a Si₃N₄/SiO₂/Si Electret

Tzeng

Lin

et al. 2006

Advanced Materials

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Metal and semiconductor nanoparticles display fascinating size-dependent structural, electronic, optical, magnetic, and chemical properties, which make them promising materials to be tailored and functionalized as fundamental building blocks for emerging nanotechnology applications. [1,2] Because of the strong dependence of nanoparticle properties on their quantum-scale dimensions, the synthesis of nanoparticles with a small size and shape variation is of key importance. At present, size-, shape-, composition-, and surface-chemistry-controlled nanoparticles can be synthesized by colloidal-solution methods for a wide range of materials. [3,4] Furthermore, strategies have been developed in which monodispersed nanoparticles can form self-assembled, long-range nanoparticle lattices (2D and 3D) under appropriate conditions. [1,2,5,6] The next important challenge for emerging nanotechnological applications (chemical and biological sensing, electronics, optoelectronics) is to perform controlled and hierarchical self-assembly of monodispersed nanoparticles from the solution phase into ordered and specifically designed nanoparticle structures immobilized on solid-surface templates. In this paper, we report an approach for controlled assembly of metal (Au) and semiconducting (CdSe/ZnS core/shell) thiol-terminated nanoparticles onto electrically patterned Si 3 N 4 /SiO 2 /Si (NOS) electret films with an unprecedented resolution.In the past few years, several important breakthroughs in scanning-probe-based lithographic techniques using tip-induced local electrochemical reactions of self-assembled monolayers (SAMs) [7][8][9][10] or tip-induced local-transport processes, such as dip-pen nanolithography, [11,12] were developed for fabricating surface templates, which can be used to assemble nanoparticles on solid supports. In these techniques, the patterning process is realized by molecular reaction or transport through a water meniscus that naturally occurs between the tip and sample under ambient conditions. Therefore, the typical resolution and writing speed of such techniques is controlled by parameters such as probe scan speed, temperature, humidity, and molecule type. Furthermore, the reaction or transport rate is limited by the reaction or ink-transport process. As a result, these types of lithographic mechanism limit the line-writing speed to the range 0.1-10 lm s -1 and the dotwriting time to the range of a few milliseconds to tens of seconds per dot (size-dependent) under ambient conditions. [7][8][9][10][11][12] Recently, electrostatic-force-based assembly of nanoparticles has been proposed as a general, precise, and reliable methodology for such purposes. [13][14][15][16][17][18][19][20][21][22] In the most direct type of electrostatic-force-based assembly, charge patterns are created by scanning-probe or microcontact charging techniques onto electret materials via electron-or hole-tunneling processes. [16][17][18][19][20] As the electret materials can retain electric charge or polarization for a long time, these ch...

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confidence: 99%

Templated Self‐Assembly of Colloidal Nanoparticles Controlled by Electrostatic Nanopatterning on a Si₃N₄/SiO₂/Si Electret

Tzeng

Lin

et al. 2006

Advanced Materials

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“…Nevertheless, in the fields of combinatorial chemistry or the development of electric and optical devices, spatially defined and highly precise particle deposition is essential to achieve high densities, e.g., in the synthesis of peptide arrays, based on combinatorial deposition of micro particles containing amino acids (Beyer et al 2007), or in nano particle patterning (Krinke et al 2001(Krinke et al , 2002Fudouzi et al 2002;Kim et al 2006;Lee et al 2009). …”

Section: Introductionmentioning

confidence: 99%

High-Precision Combinatorial Deposition of Micro Particle Patterns on a Microelectronic Chip

Löffler¹,

Wagner²,

König³

et al. 2011

Aerosol Science and Technology

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The behavior of charged bio polymer micro particles when deposited onto a CMOS chip can be analytically modeled in form of the incompressible Navier-Stokes equation and the electrostatic Poisson equation, as we describe in this article. Based on these models, numerical simulations of depositions can be implemented in COMSOL that lead to improvements in the experimental setup, optimizing the size and charge distribution of the micro particles.Adapting the experiments according to the simulation results, we will show the powerful gain in deposition precision, which is essential for a contamination-free deposition and hence high quality combinatorial deposition.

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“…When a nonconducting substrate has a charge pattern on it, nanoparticles with opposite charges are attracted to the charge patterned area. Fudouzi et al have used electron beams 9,14 and ion beams 11,16 to generate charge patterns on calcium titanate ͑CaTiO 3 ͒ to attract precharged or polarizable particle suspensions with ϳ20 m resolution. To overcome yield and throughput issues, researchers have used metal coated polydimethylsiloxane stamps 13 to generate surface charges on the contacted area.…”

Section: Introductionmentioning

confidence: 99%

Ultrafast patterning of nanoparticles by electrostatic lithography

Joo

Moon

Jacobson

2006

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Articles you may be interested inElectroless deposition of metal nanoparticle clusters: Effect of pattern distance Noble metal nanoparticle patterning deposition using pulsed-laser deposition in liquid for surface-enhanced Raman scattering Electron beam lithography is one of the best tools for patterning nanostructures, but its usage is limited due to slow processing. To enhance the patterning speed, the authors used a low dose electron beam to generate a "latent" charge pattern image and then create a real pattern by attaching positively charged particles by electrospray. Hard baked 2.3 m thick polymethylmethacrylate substrates were irradiated with a 2 keV electron beam with a dose of 50 nC/ cm 2 . Positively charged silver nanoparticles were generated by an electrospray technique in which a nanoparticle solution mixed with hexane was sprayed through a 15 m diameter capillary tip with an applied potential of 4.5 kV. Charged nanoparticles were deposited to the charge patterned sites by electrostatic attraction with a resolution of 0.7 m. This patterning approach, which we call "electrostatic lithography," represents a speed increase of ϳ20 times over standard fast electron beam resists that require typical doses of 1 C/cm 2 . This approach may lead to a general capability for ultrafast patterning of nanomaterial building blocks including nanoparticles and nanotubes without requiring additional etching or other processing steps.

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Site-Controlled Deposition of Microsized Particles Using an Electrostatic Assembly

Cited by 62 publications

References 8 publications

Templated Self‐Assembly of Colloidal Nanoparticles Controlled by Electrostatic Nanopatterning on a Si₃N₄/SiO₂/Si Electret

Templated Self‐Assembly of Colloidal Nanoparticles Controlled by Electrostatic Nanopatterning on a Si₃N₄/SiO₂/Si Electret

High-Precision Combinatorial Deposition of Micro Particle Patterns on a Microelectronic Chip

Ultrafast patterning of nanoparticles by electrostatic lithography

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Site-Controlled Deposition of Microsized Particles Using an Electrostatic Assembly

Cited by 62 publications

References 8 publications

Templated Self‐Assembly of Colloidal Nanoparticles Controlled by Electrostatic Nanopatterning on a Si3N4/SiO2/Si Electret

Templated Self‐Assembly of Colloidal Nanoparticles Controlled by Electrostatic Nanopatterning on a Si3N4/SiO2/Si Electret

High-Precision Combinatorial Deposition of Micro Particle Patterns on a Microelectronic Chip

Ultrafast patterning of nanoparticles by electrostatic lithography

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Templated Self‐Assembly of Colloidal Nanoparticles Controlled by Electrostatic Nanopatterning on a Si₃N₄/SiO₂/Si Electret

Templated Self‐Assembly of Colloidal Nanoparticles Controlled by Electrostatic Nanopatterning on a Si₃N₄/SiO₂/Si Electret