2000
DOI: 10.1063/1.1306647
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SiO 2 -passivated lateral-geometry GaN transparent Schottky-barrier detectors

Abstract: We report on a transparent Schottky-barrier ultraviolet detector on GaN layers over sapphire substrates. Using SiO2 surface passivation, reverse leakage currents were reduced to a value as low as 1 pA at 5 V reverse bias for 200 μm diameter device. The device exhibits a high internal gain, about 50, at low forward biases. The response time (about 15 ns) is RC limited, even in the internal gain regime. A record low level of the noise spectral density, 5×10−23 A2/Hz, was measured at 10 Hz. We attribute this low … Show more

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Cited by 103 publications
(51 citation statements)
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“…Precise and reliable control of the depletion layer width by the Schottky contact without leakage currents is extremely important in these devices. However, GaN-based Schottky interfaces are known to suffer from unusually large leakage currents under reverse bias [1][2][3]. Excess leakage currents through a Schottky gate strongly affects, not only gate-control and power consumption, but also the noise performance in GaN-based FET devices as recently pointed out [4].…”
Section: Introductionmentioning
confidence: 99%
“…Precise and reliable control of the depletion layer width by the Schottky contact without leakage currents is extremely important in these devices. However, GaN-based Schottky interfaces are known to suffer from unusually large leakage currents under reverse bias [1][2][3]. Excess leakage currents through a Schottky gate strongly affects, not only gate-control and power consumption, but also the noise performance in GaN-based FET devices as recently pointed out [4].…”
Section: Introductionmentioning
confidence: 99%
“…This process is advantageous to reduce leakage current. Moreover, the SiO 2 /SiN x dielectric film reflector on sidewalls of step can separate from water vapor and dust to protect the sidewalls of the step from contaminating and to improve the reliability of GaN-LED [15,16] .…”
Section: Resultsmentioning
confidence: 99%
“…However, the low-doping efficiencies typically associated with Al x Ga 1Àx N layers having high aluminum content can limit the fabrication of heavily doped p-type and n-type layers [7,8]. Even though these difficulties exist, several groups have reported promising results for the development of UV photodetectors, including such devices as photoconductors [9,10], Schottky photovoltaic detectors [11][12][13], p-n and p-i-n photodetectors [3,14,15], metal-semiconductor-metal (MSM) photodetectors [2,16], avalanche photodiodes [17] and phototransistors [18]. Among these devices, p-i-n photodetector structures are especially attractive, because they are compact, consume less power, are rugged and reliable, and can easily be integrated with other electronic circuitry.…”
Section: Introductionmentioning
confidence: 98%