1997
DOI: 10.1063/1.120438
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SiO 2 film thickness metrology by x-ray photoelectron spectroscopy

Abstract: Silicon dioxide films grown by industrial thermal furnace, rapid thermal, and low-pressure thermal methods were measured by x-ray photoelectron spectroscopy, transmission electron microscopy (TEM), spectroscopic ellipsometry, and capacitance–voltage analysis. Based on TEM measurements, the photoelectron effective attenuation lengths in the SiO2 and Si are found to be 2.96±0.19 and 2.11±0.13 nm, respectively. The oxide physical thicknesses (range from 1.5 to 12.5 nm) as measured by all above techniques are in g… Show more

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Cited by 227 publications
(112 citation statements)
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“…Precise thickness measurement of these 24 ultra thin films is very critical in the development of Si-based devices. Oxide thickness is commonly measured by ellipsometry [8] but as film thicknesses is scaled down to several atomic layers, surface analytical techniques such as XPS become applicable tools to quantify these films [9]. An XPS measurement offers the additional advantage of providing information such as surface contamination and chemical composition of the film.…”
Section: Introductionmentioning
confidence: 99%
“…Precise thickness measurement of these 24 ultra thin films is very critical in the development of Si-based devices. Oxide thickness is commonly measured by ellipsometry [8] but as film thicknesses is scaled down to several atomic layers, surface analytical techniques such as XPS become applicable tools to quantify these films [9]. An XPS measurement offers the additional advantage of providing information such as surface contamination and chemical composition of the film.…”
Section: Introductionmentioning
confidence: 99%
“…The presence of Si, O and SiO2 is detected in the spectrum. By further analysis of the results, the oxide thickness was also calculated to be about 3 nm [33,104].…”
Section: X-ray Photoelectron Spectroscopy (Xps)mentioning
confidence: 99%
“…One of the frequently used methods of thin film thickness determination is the X-ray Rreflectivity (XRR) [6][7]. This is a non-destructive procedure, which enables to determine the film thickness with the angstrom resolution [6].…”
Section: Theory Concerning Measurement Of Nanolayer Thicknessmentioning
confidence: 99%