2021
DOI: 10.1063/5.0055213
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Single-step etched grating couplers for silicon nitride loaded lithium niobate on insulator platform

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Cited by 37 publications
(17 citation statements)
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“…The devices are interfaced by grating couplers with a grating period of 920 nm and a duty circle of 0.4. [ 40 ]…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…The devices are interfaced by grating couplers with a grating period of 920 nm and a duty circle of 0.4. [ 40 ]…”
Section: Resultsmentioning
confidence: 99%
“…The devices are interfaced by grating couplers with a grating period of 940 nm and duty circle of 0.4. [ 40 ] The normalized results are shown in Figure 5b. The measured insertion loss for TM 0 mode is about 1.3 dB, and the PER is about 30.6 dB, at a wavelength of 1550 nm.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Currently, various active and passive devices have been proposed and demonstrated on the Si 3 N 4 -LNOI hybrid platform. [19][20][21][22][23][24][25][26][27][28][29][30] DOI: 10.1002/adpr.202200121 Lithium niobate on insulator (LNOI) has been demonstrated as a promising platform for photonic integrated circuits (PICs), thanks to its excellent properties such as strong electro-optic effect, low material loss, and wide transparency window. Herein, a monolithic PIC for high-speed data communication application on a lithium-niobate-etchless platform with silicon nitride (Si 3 N 4 ) as a loading material is proposed and demonstrated.…”
Section: Introductionmentioning
confidence: 99%
“…Thus, the electrode absorption loss is almost negligible. Since it is difficult to achieve high-quality etching of TFLN, etchless TFLN platform has been considered, in which the optical waveguides were formed by patterning other materials (e.g., Si [30], Si 3 N 4 [31], polymer [32]) atop the etchless TFLN wafer. Based upon such a scheme, etchless TFLN-based AOM has been realized with modulation frequency beyond 4 GHz and Q factor higher than 500,000 [32].…”
Section: Introductionmentioning
confidence: 99%