Single-Source Precursors to Niobium Nitride and Tantalum Nitride Films

Abstract

Herein we report our efforts to prepare new precursors to niobium nitride (NbN) and tantalum nitride (TAN, Ta3N5) thin films. Treatment of MC15 (M = Nb, Ta) with tertbutylamine in benzene solvent affords complexes of the formula [MCI2 (NtBu)(NHtBu)(NH2tBu)]2. The niobium complex [NbC12(NtBu)(NHtBu)- (NH2tBu)]2 affords NbN films on glass substrates between 500-600 °C, while the tantalum analog [TaC12(NtBu)(NHtBu)(NH2tBu)]2 gives films of Ta3N5 in this temperature range. Treatment of MCI5 (M = Nb, Ta) with 1,1-dimethylhydrazine in dichloromethane solvent affords complexes of the formula [MC12(NNMe2)(NHNMe2)(NH2NMe2)]n. These hydrazido complexes afford cubic MN films upon glass substrates at ≥400°C. Analyses of the films are presented.

Highly active tantalum(v) nitride nanoparticles prepared from a mesoporous carbon nitride template for photocatalytic hydrogen evolution under visible light irradiation

“…From the TEM images, the averages of these lengths were ca. 7 and 15 nm for Ta 3 N 5 (7), 10 and 17 nm for Ta 3 N 5 (12), and 12 and 22 nm for Ta 3 N 5 (24). Judging from the shape and size of the particles, which did not exactly match the pores in the template, growth of the Ta 3 N 5 particles might continue once the template was removed, under the present conditions, i.e., 3 h nitridation time.…”

“…It is usually prepared by nitridation of tantalum oxide. [2][3][4][5][6][7][8] Other routes have also been reported, such as ammonolysis of TaCl 5 , 9,10 solid-state reaction of lithium amides with TaCl 5 , 11 thermal decomposition of organic tantalum compounds, 12 nitridation of Ta metal particles, 13 ammonolysis of TaS 2 , 14 and solvothermal reaction of TaCl 5 and LiNH 2 in refluxing mesitylene or benzene. 15,16 The photocatalytic activity of bulk Ta 3 N 5 was first reported for oxygen and hydrogen evolution from water in the presence of sacrificial agents.…”

Low-temperature MOCVD of chromium carbonitride coatings from tetrakis(diethylamido)chromium and pyrolysis mechanism of this single-source precursor

“…12, 189-199 (1998) probable since ethylene was not detected and the nitrogen content of the films, probably originating from the ethylimido complex, is only a few atoms per cent. Indeed, related organoimido complexes of tantalum 41 and niobium 42 were used successfully as single-source precursor for the growth of mononitrides, owing to the strong M=N bonds. It is noteworthy that the reaction pathway (i) seems to be more favorable using V(NEt 2 ) 4 than using Cr(NEt 2 ) 4 because, under similar MOCVD conditions, the nitrogen content of the vanadium-based coatings is higher than than that of the chromiumbased ones and ethylene was observed as a byproduct in the decomposition of V(NEt 2 ) 4 whereas it was not with the Cr-derivative.…”

Insulating Materials

“…However, no data on the insulating properties or film purity was reported [205]. However, no data on the insulating properties or film purity was reported [205].…”