Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features

Plasmonic Nanolithography: A Review

“…And it was demonstrated that the finer experimental results are easy to achieve at smaller incident angle [101]. Using this type of lithography system, 1D patterns using two-beam interference and 2D patterns using four-beam interference have been demonstrated [101][102][103][104][105][106][107][108][109][110][111]. The interferential beams are The plasmonic head flying 20 nm above the rotating substrate.…”

Electro-Ionic Control of Surface Plasmons in Graphene-Layered Heterostructures

“…1−3 Additionally, advancements in nanofabrication techniques have allowed the invention of integrated optical devices or photonic integrated circuits where many different optical components can be fabricated on a single chip. 4,5 Such integrated optical devices are particularly beneficial for optical communications as the size and scale of the optical components, such as the transmitters and receivers, can be greatly reduced. 6 However, as their sizes approach subwavelength scale, it becomes a greater challenge for precise control and tuning of light in the integrated optical device.…”

“…The control of light and transportation of photons had allowed the rapid development of optical communications technology over the past few decades. − Additionally, advancements in nanofabrication techniques have allowed the invention of integrated optical devices or photonic integrated circuits where many different optical components can be fabricated on a single chip. , Such integrated optical devices are particularly beneficial for optical communications as the size and scale of the optical components, such as the transmitters and receivers, can be greatly reduced . However, as their sizes approach subwavelength scale, it becomes a greater challenge for precise control and tuning of light in the integrated optical device. , Plasmonic-based optical devices are receiving increasing attention for developing integrating optical devices where light can be tuned using an externally applied electric field. , Because of the resonant coupling of the incident light and the subwavelength surface plasmon (SP) waves at the metal–dielectric interface, plasmonic-based optical devices can be interrogated using optical and electrical means. − Typically, plasmonic devices are developed to be used as highly sensitive biosensors and bioimaging/therapeutic agents in biomedical applications, and as plasmonic solar cells in photovoltaics, to name a few. − However, in recent years, plasmonic devices are gaining interest for the development of optical switches for tuning of optical light using special optical materials such as piezoelectric materials, liquid crystals, quantum dots, or nonlinear optical materials. − …”

Theoretical investigation of two-dimensional sub-wavelength structures fabricated by multi-beam surface plasmon interference lithography

“…Numerous researchers have theoretically and experimentally reported SP lithography methods based on grating coupling [21][22][23][24] and prism coupling [25][26][27], while the latter method has the advantage of being maskless. Sreekanth et al generated one-dimensional grating features with a 156 nm period by employing two-beam SP [28] and two-dimensional (2D) dot array patterns with a 175 nm period by utilizing four-beam SP [29] with an excitation wavelength of 364 nm. However, the use of additional beams and other abundant lattice morphologies have not been studied, and the theoretical simulations have not been described in detail.…”