2015
DOI: 10.1088/0957-4484/26/30/305203
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Single-electron and quantum confinement limits in length-scaled silicon nanowires

Abstract: Quantum-effects will play an important role in both future CMOS and 'beyond CMOS' technologies. By comparing single-electron transistors formed in unpatterned, uniform-width silicon nanowire devices with core widths from ~5 -40 nm, and gated lengths of 1 µm and ~50 nm, we show conditions under which these effects become significant. Coulomb blockade drain-source current-voltage characteristics, and single-electron current oscillations with gate voltage have been observed at room temperature. Detailed electrica… Show more

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Cited by 13 publications
(12 citation statements)
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“…In the former case, the potential barrier may be associated with additional series QDs, i.e. a multiple tunnel junction (MTJ) system 9 Coulomb diamonds lying between larger diamonds in the electrical characteristics 23 . In Fig.…”
Section: Resultsmentioning
confidence: 99%
“…In the former case, the potential barrier may be associated with additional series QDs, i.e. a multiple tunnel junction (MTJ) system 9 Coulomb diamonds lying between larger diamonds in the electrical characteristics 23 . In Fig.…”
Section: Resultsmentioning
confidence: 99%
“…When a semiconductor nanowire with small enough capacitance ( C i ) is coupled to electrodes by insulating tunnel junctions, a single electron nanowire FET could be built (Figure , fourth row; Figure a). Specifically, the charging energy of one electron to the nanowire is defined by E c = e 2 /2 C i . When the capacitance C i is small enough so that charging energy E c exceeds thermal energy kT , a precise control of the charging of the nanowire channel can be realized to the single electron level.…”
Section: Fundamental Electronic Properties Of Single Nanowire Transis...mentioning
confidence: 99%
“…Correspondingly, the current curves also start to increase rapidly from this conduction band edge position for all bias voltages, which is exactly the evidence of the position of the threshold voltage (V th ). [20] Generally, the highest Fermi energy position in the channel should reach the Fermi level of the source pool at V g = V th , where the energy barrier between the source and the channel should diminish, resulting in the device turning on. The transverse electric field introduced from source and drain voltage has quite limited influence on the highest channel energy level close to the source region, as well as the energy barrier between the channel and the source pool, resulting in the independence of the V th position on V DS voltage.…”
Section: Threshold Characteristics With V Ds Voltage Changingmentioning
confidence: 99%