2011
DOI: 10.5560/zna.2011-0004
|View full text |Cite
|
Sign up to set email alerts
|

Single Crystal Charge Density Studies of Thermoelectric Material Indium Antimonide

Abstract: The average structure of the thermoelectric material indium antimonide (InSb) has been studied in terms of the electron density distribution using the single crystal X-ray intensity data. The charge density of this material has been studied including and excluding the quasi-forbidden h + k + l = 4n + 2 type reflections using the maximum entropy method (MEM). Both the pictorial and numerical results of the experimental electron density show mixed ionic and covalent character in InSb. The use of InSb as a thermo… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2016
2016
2016
2016

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 9 publications
0
1
0
Order By: Relevance
“…Due to the diversity in the growth techniques, one should easily differentiate between the fabrications of horizontal NWs, that is, NWs lying in the substrate plane with the growth of vertical NWs, that is, NWs oriented perpendicular to the substrate. During the top-down fabrication method, InSb NWs are mostly fabricated by focused ion beam irradiation of InSb wafer [ 65 , 66 ] or by lithography and then etching steps, with the help of reactive ion etching after electron-beam lithography [ 67 ]. This phenomenon of lithography is simply described here because the detail of it is far from the contents of this article.…”
Section: Reviewmentioning
confidence: 99%
“…Due to the diversity in the growth techniques, one should easily differentiate between the fabrications of horizontal NWs, that is, NWs lying in the substrate plane with the growth of vertical NWs, that is, NWs oriented perpendicular to the substrate. During the top-down fabrication method, InSb NWs are mostly fabricated by focused ion beam irradiation of InSb wafer [ 65 , 66 ] or by lithography and then etching steps, with the help of reactive ion etching after electron-beam lithography [ 67 ]. This phenomenon of lithography is simply described here because the detail of it is far from the contents of this article.…”
Section: Reviewmentioning
confidence: 99%