2020
DOI: 10.1049/iet-cds.2020.0015
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Single and double‐gate based AlGaN/GaN MOS‐HEMTs for the design of low‐noise amplifiers: a comparative study

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Cited by 16 publications
(8 citation statements)
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References 37 publications
(43 reference statements)
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“…From the figures, it is observed that as the oxide thickness decreases its drain current increases. It is because when oxide thickness decreases, the threshold voltage of the FET transistor decreases which increases the induced charge carriers in the channel and thereby increases the drain current 31,32 …”
Section: Different Simulation Results With Explanationsmentioning
confidence: 99%
“…From the figures, it is observed that as the oxide thickness decreases its drain current increases. It is because when oxide thickness decreases, the threshold voltage of the FET transistor decreases which increases the induced charge carriers in the channel and thereby increases the drain current 31,32 …”
Section: Different Simulation Results With Explanationsmentioning
confidence: 99%
“…However, the short channel effects (SCE) have been seen for the gate length below 250 nm, and in turn, the device noise figure declined. 21,22 To circumvent these adverse effects, multigate structures [23][24][25][26][27] have been emerging as the primary choice due to excellent gate controllability. Low-frequency noise (LFN) measurements of these devices have been undergone to study the effects of impurities and defects and to observe the quality and reliability of these devices.…”
Section: Introductionmentioning
confidence: 99%
“…Low-frequency noise (LFN) measurements of these devices have been undergone to study the effects of impurities and defects and to observe the quality and reliability of these devices. 28,29 Moreover, Panda et al 23 have shown an improved device performance of double gate (DG) AlGaN/GaN MOSHEMT as compared to single gate (SG) MOSHEMT. Sanabrai et al 30 have shown the effect of gate leakage current on the noise figure of AlGaN/GaN HEMT.…”
Section: Introductionmentioning
confidence: 99%
“…heterojunctions, tandem structures and stability of CZTS devices to enhance the device performance 10 . Furthermore, various materials and techniques are used to improve the electrical and optical properties of CZTS like doping, surface passivation, and anti‐reflection coatings 11 …”
Section: Introductionmentioning
confidence: 99%