Simultaneous removal of micropollutants, antibiotic resistant bacteria, and antibiotic resistance genes using graphitic carbon nitride under simulated solar irradiation

The co-occurrence of various chemical and biological contaminants of emerging concerns has hindered the application of water recycling. This study aims to develop a heterogeneous photo-Fenton treatment by fabricating nano pyrite (FeS2) on graphene oxide (FeS2@GO) to simultaneously remove antibiotic resistant bacteria (ARB), antibiotic resistance genes (ARGs), and micropollutants (MPs). A facile and solvothermal process was used to synthesize new pyrite-based composites. The GO coated layer forms a strong chemical bond with nano pyrite, which enables to prevent the oxidation and photocorrosion of pyrite and promote the transfer of charge carriers. Low reagent doses of FeS2@GO catalyst (0.25 mg/L) and H2O2 (1.0 mM) were found to be efficient for removing 6-log of ARB and 7-log of extracellular ARG (e-ARG) after 30 and 7.5 min treatment, respectively, in synthetic wastewater. Bacterial regrowth was not observed even after a two-day incubation. Moreover, four recalcitrant MPs (sulfamethoxazole, carbamazepine, diclofenac, and mecoprop at an environmentally relevant concentration of 10 μg/L each) were completely removed after 10 min of treatment. The stable and recyclable composite generated more reactive species, including hydroxyl radicals (HO•), superoxide radicals (O2 • –), singlet oxygen (1O2). These findings highlight that the synthesized FeS2@GO catalyst is a promising heterogeneous photo-Fenton catalyst for the removal of emerging contaminants.

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“…The detailed analytical methods for standard preparation and quantification of MPs are described in our previous studies , as well as Text S7.…”

Section: Methodsmentioning

confidence: 99%

Simultaneous Removal of Antibiotic Resistant Bacteria, Antibiotic Resistance Genes, and Micropollutants by FeS₂@GO-Based Heterogeneous Photo-Fenton Process

Ahmed

Zhong

Wang

et al. 2022

Environ. Sci. Technol.

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“…The bacterial strain and bacterial growth conditions were documented in our previous study. 28 2.2. Simultaneous Removal of Chemical and Biological Contaminants.…”

Section: Methodsmentioning

confidence: 99%

“…The added PMS was able to further enhance the removal process of micropollutants. For example, the recalcitrant micropollutant, BTA, was calculated with a kinetic constant of 0.084 in the g-C 3 N 4 photocatalytic system, 28 while the constant was increased to 0.1 after the introduction of PMS. Compared with other technologies, the g-C 3 N 4 /PMS system is able to simultaneously remove multiple MPs in a shorter treatment time, thus showing a promising technology in treating MPs.…”

Section: Photocatalytic Performance Toward Multiplementioning

confidence: 99%

“…Previous studies mainly focused on the assessment of g-C 3 N 4 -based photocatalysts in removing single MPs at a high concentration (mg/L level). , However, there are very few studies evaluating their performance in simultaneous removal of chemical and biological contaminants . Our previous study showed that a long contacting time (1 h) was needed to achieve 6.2-log reduction of ARB, and an even longer contacting time (2 h) was required to remove approximately 98% e-ARGs (β-lactam and tetracycline resistance genes), suggesting that it is necessary to enhance the inactivation activity of g-C 3 N 4 before this oxidation method becomes a practically useful solution.…”

Section: Introductionmentioning

confidence: 99%

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Synergistic Combination of Graphitic Carbon Nitride and Peroxymonosulfate for Efficient Photocatalytic Destruction of Emerging Contaminants under Simulated Solar Irradiation

Zhong

Ahmed

et al. 2022

ACS EST Water

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The prevalence of micropollutants (MPs) and antibiotic resistance in various aquatic environments has raised increasing concerns for public health and ecological security. Conventional wastewater treatment processes exhibit a relatively limited removal efficiency to these contaminants. Although photocatalytic processes are proposed as an effective solution, very few studies have investigated the simultaneous removal of chemical and biological contaminants. To develop a "onestop" photocatalytic process, this study combined urea-based graphitic carbon nitride (g-C 3 N 4 ) with peroxymonosulfate (PMS) and evaluated its performance in the simultaneous removal of multiple MPs, antibioticresistant bacteria (ARB), and antibiotic resistance genes (ARGs) at environmentally relevant concentrations. The system removed 87% of MPs (10 μg/L each) and achieved 6.5-log ARB reduction within a 5 min treatment. In addition, the concentrations of extracellular ARGs (e-tetA and e-bla TEM-1 ) were rapidly decreased, with 4.8-log and 6.7-log reductions after a 30 min treatment, respectively. Atomic force microscopy images showed that the naked plasmid DNA was destructed. Radical quenching and electron paramagnetic resonance experiments further confirmed that both radical and nonradical pathways are involved in ARB inactivation in a g-C 3 N 4 /PMS photocatalytic system. Collectively, the g-C 3 N 4 /PMS photocatalytic system can efficiently achieve simultaneous removal of MPs and ARB as well as ARG destruction, therefore being a promising "one-stop" decontamination solution. KEYWORDS: graphitic carbon nitride (g-C 3 N 4 ), photocatalysis, micropollutants (MPs), antibiotic-resistant bacteria (ARB), antibiotic resistance genes (ARGs), peroxymonosulfate (PMS)

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“…14a). Zhong et al 310 assessed the photocatalytic activity of a urea-based g-C 3 N 4 for ARG inactivation. Atomic force microscopy was used to characterize the extracellular DNA status before and after the disinfection process.…”

Section: Reduction Of Args By Metal-free Catalyzed Aopsmentioning

confidence: 99%

Recent advances in metal-free catalysts for the remediation of antibiotics, antibiotic resistant bacteria (ARB), and antibiotic resistant genes (ARGs)

Wang

Ding

et al. 2022

J. Mater. Chem. A

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Simultaneous removal of micropollutants, antibiotic resistant bacteria, and antibiotic resistance genes using graphitic carbon nitride under simulated solar irradiation

Cited by 30 publications

References 66 publications

Simultaneous Removal of Antibiotic Resistant Bacteria, Antibiotic Resistance Genes, and Micropollutants by FeS₂@GO-Based Heterogeneous Photo-Fenton Process

Simultaneous Removal of Antibiotic Resistant Bacteria, Antibiotic Resistance Genes, and Micropollutants by FeS₂@GO-Based Heterogeneous Photo-Fenton Process

Synergistic Combination of Graphitic Carbon Nitride and Peroxymonosulfate for Efficient Photocatalytic Destruction of Emerging Contaminants under Simulated Solar Irradiation

Recent advances in metal-free catalysts for the remediation of antibiotics, antibiotic resistant bacteria (ARB), and antibiotic resistant genes (ARGs)

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Simultaneous removal of micropollutants, antibiotic resistant bacteria, and antibiotic resistance genes using graphitic carbon nitride under simulated solar irradiation

Cited by 30 publications

References 66 publications

Simultaneous Removal of Antibiotic Resistant Bacteria, Antibiotic Resistance Genes, and Micropollutants by FeS2@GO-Based Heterogeneous Photo-Fenton Process

Simultaneous Removal of Antibiotic Resistant Bacteria, Antibiotic Resistance Genes, and Micropollutants by FeS2@GO-Based Heterogeneous Photo-Fenton Process

Synergistic Combination of Graphitic Carbon Nitride and Peroxymonosulfate for Efficient Photocatalytic Destruction of Emerging Contaminants under Simulated Solar Irradiation

Recent advances in metal-free catalysts for the remediation of antibiotics, antibiotic resistant bacteria (ARB), and antibiotic resistant genes (ARGs)

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Simultaneous Removal of Antibiotic Resistant Bacteria, Antibiotic Resistance Genes, and Micropollutants by FeS₂@GO-Based Heterogeneous Photo-Fenton Process

Simultaneous Removal of Antibiotic Resistant Bacteria, Antibiotic Resistance Genes, and Micropollutants by FeS₂@GO-Based Heterogeneous Photo-Fenton Process