2009
DOI: 10.1016/j.susc.2009.08.003
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Simultaneous optical second harmonic and sum frequency intensity image observation of hydrogen deficiency on a H–Si(111) 1×1 surface after IR light pulse irradiation

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Cited by 15 publications
(22 citation statements)
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“…1 was used in order to study the micron-scale spatial distribution of hydride species on the Si(111) surface. [13] By using the SFG microscopy, one can take the SFG intensity image and the SFG spectrum of the same area on the Si surface simultaneously.…”
Section: Methodsmentioning
confidence: 99%
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“…1 was used in order to study the micron-scale spatial distribution of hydride species on the Si(111) surface. [13] By using the SFG microscopy, one can take the SFG intensity image and the SFG spectrum of the same area on the Si surface simultaneously.…”
Section: Methodsmentioning
confidence: 99%
“…[5] However, anisotropy or island structure of hydrogen distribution formed as a result of the interaction between adsorbates was not observed directly in those works. Thus, we have used SFG microcopy [13] for direct observation of hydrogen diffusion. SFG microscopy is the only method for nondestructive observation of hydrogen distribution on the silicon surface.…”
Section: Introductionmentioning
confidence: 99%
“…These results suggest that most of the SFG signals in the irradiated area are due to the surface electronic level associated with the dangling bonds formed after hydrogen desorption. We suggest that the signals may have been enhanced by an electronic transition caused by the IR probe light [28]. In Figure 6(b), one can see strong NR-SFG signals generated at the irradiated areas; these may originate from the dangling bonds created after the hydrogen desorption caused by the pulse light irradiation.…”
Section: Sfg Microscopy Of Hydrogen Species On a Si(111) Surfacementioning
confidence: 91%
“…However, no one has developed SFG microscopy for observing a sample in UHV conditions. Thus, we decided to develop a multifunctional SFG microscope to facilitate convenient analysis of a semiconductor surface under UHV conditions [28][29][30][31][32].…”
Section: Sfg and Shg Microscopymentioning
confidence: 99%
“…In analogy with spectroscopic VR-SFG measurements, several wide-field, noncollinear illumination schemes have been utilized for microscopic applications. In such wide-field configurations, the SFG radiation from a large area is commonly captured by an objective lens and projected onto a CCD camera [811]. The highest lateral resolution attained with a wide-field geometry has been estimated as ~1.1 μ m [12].…”
mentioning
confidence: 99%