2018
DOI: 10.1016/j.tca.2018.06.016
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Simultaneous measurement of infrared absorption coefficient of Carbon doped Al0.33Ga0.67As thin film and thermal boundary resistance between thin film and heavily Zn doped GaAs substrate using spectrally-resolved modulated photothermal infrared radiometry

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Cited by 8 publications
(3 citation statements)
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“…These processes are strongly dependent on the band gap of the material but also on its thermal properties. The increase in thermal diffusivity is associated with the decrease in carriers' lifetime as a result of the increase in carriers' concentration according to the relation n ∝ 1/τ [10,25], where τ is the carrier lifetime and n is the carriers' concentration. Furthermore, the modification of TiO 2 introduced additional defects within the material, which in turn limited the carriers' lifetime since they act as recombination centers in the band gap.…”
Section: Indirect Band Gap Evmentioning
confidence: 99%
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“…These processes are strongly dependent on the band gap of the material but also on its thermal properties. The increase in thermal diffusivity is associated with the decrease in carriers' lifetime as a result of the increase in carriers' concentration according to the relation n ∝ 1/τ [10,25], where τ is the carrier lifetime and n is the carriers' concentration. Furthermore, the modification of TiO 2 introduced additional defects within the material, which in turn limited the carriers' lifetime since they act as recombination centers in the band gap.…”
Section: Indirect Band Gap Evmentioning
confidence: 99%
“…Unfortunately, their position and intensity critically depend on the nature of the semiconductors (e.g., size, crystal phase and morphology), excitation wavelength, irradiation time and the measurement circumstances, which may disturb the measurements and give unreliable results. Thus, the use of more sensitive and reliable techniques is required, such as those based on photothermal effect [9][10][11][12][13]. Among them, photothermal beam deflection spectrometry (BDS) is of high interest as it is suitable for the characterization of opaque and weakly absorbing samples.…”
Section: Introductionmentioning
confidence: 99%
“…It is not routinely applied to measurements of optical properties such as coefficient spectra of optical absorption. Photo thermal radiometry is a technique applied to characterize materials recombination and thermal parameters [19][20][21][22][23]. A comparison of these methods from the point of view of investigations of recombination parameters in silicon is presented in paper [24].…”
Section: Introductionmentioning
confidence: 99%