Simultaneous dynamic electrical and structural measurements of functional materials

Abstract

Articles you may be interested inModeling of resonant magneto-electric effect in a magnetostrictive and piezoelectric laminate composite structure coupled by a bonding material J. Appl. Phys. 112, 064109 (2012) A new materials characterization system developed at the XMaS beamline, located at the European Synchrotron Radiation Facility in France, is presented. We show that this new capability allows to measure the atomic structural evolution (crystallography) of piezoelectric materials whilst simultaneously measuring the overall strain characteristics and electrical response to dynamically (ac) applied external stimuli. C 2015 AIP Publishing LLC. [http://dx

Simultaneous Large Optical and Piezoelectric Effects Induced by Domain Reconfiguration Related to Ferroelectric Phase Transitions

“…Other details were described elsewhere. [65,66] A Maxipix 2D camera was used to align and orient the crystal, and subsequently it was used to obtain reciprocal space maps, allowing full 3D reconstruction of the reciprocal space.…”

In Situ Electric-Field Study of Surface Effects in Domain Engineered Pb(In1/2Nb1/2)O3-Pb(Mg1/3Nb2/3)O3-PbTiO3 Relaxor Crystals by Grazing Incidence Diffraction

“…Ferroelectric current as a function of applied voltage was measured with a virtual earth current amplifier, and the charge was then calculated through numerical integration [32]. Details are provided in reference [33], and shown in Figure S3.…”

“…The applied voltage, ferroelectric current and X-ray intensity were all measured simultaneously and recorded with a data acquisition system based on the ESRF-designed MUSST card. The card can simultaneously record X-ray intensities and analogue voltages up to 24 bit resolution with a sampling rate of 40 kHz [33]. The full in situ capabilities at the XMaS beamline, ESRF, for characterizing ferroelectrics, developed by Electrosciences and the University of Liverpool, include electric field, temperature, frequency, magnetic field and stress.…”

XMaS @ the ESRF

“…Being open to such developments is at the heart of the operational ethos of the beamline. We continue to expand our capabilities through development of new metrologies and techniques including simultaneous measurements of several data channels at ever-increasing rates (currently several 100 kHz) [11,12] and extending the polarization control using phase retarders operating as a quarter-wave plate [13]. A newly designed (GI)-SAXS and reflectometry (XRR) system has been commissioned and provides enhanced and more efficient operations together with simultaneous WAXS measurements [14].…”

“…As well as academic output, information for the public is shared through our social media platforms (Twitter: @XMaSBeam and @XMaSSchoolTrip as well as a YouTube channel). In addition, XMaS played a significant role within the EURAMET Nanostrain Project (2013-2016): Novel electronic devices based on the control of strain at the nanoscale [11]. This collaboration brought together EU metrology laboratories along with industrial partners to explore new strain-mediated transistor devices to replace current CMOS technology.…”