Simultaneous Direct Formation of Fine Copper Mesh Transparent Electrodes on Both Sides of Glass Substrate Using Wavelength Selective Photoreactive Niobium Complexes

Abstract

Photopatterning of two nitrobenzyloxycarbonylcatechol-niobium complexes were investigated. Resulting niobate films were found to selectively adsorb palladium that enabled selective plating of niobium oxide latent images. In combination with selective electroless plating, methods for simultaneous photopatterning of two independent pattern, or aligned and identical pattern transparent electrodes on each side of glass substrate were developed using wavelength selective photoreactions that was consequential to variation in the complexes photoexcitation profile. An electrode material of sheet resistance 1-2 Ω/□ and approximate optical transmittance of 90% was formed by deposition of 5 μm line width and 100 μm pitch copper mesh.

Formation of Micrometer Scale Metal Structures on Glass by Selective Electroless Plating on Photopatterned Titanium and Copper Containing Films

“…However, despite optimization, the nitrobenzyl ester photoresponses have been low compared to DNQ based compositions, and atomic level resolution surpasses the resolution limits of industrial photolithography equipment. Among the investigated NBOC-M complexes, selective electroless plating on titanium oxide, 15 niobium oxide, 16 palladium and palladium composite films 17 derived by pyrolysis of the respective patterned complex film has been accomplished. Patterned titanium oxide and niobium oxide films have been shown to selectively adsorb palladium catalyst, which initiated the autocatalytic deposition reaction resulting in direct formation of electroless plated metal patterns on a substrate surface.…”