2020
DOI: 10.1186/s11671-020-03360-7
|View full text |Cite
|
Sign up to set email alerts
|

Simulation Study of the Double-Gate Tunnel Field-Effect Transistor with Step Channel Thickness

Abstract: Double-gate tunnel field-effect transistor (DG TFET) is expected to extend the limitations of leakage current and subthreshold slope. However, it also suffers from the ambipolar behavior with the symmetrical source/drain architecture. To overcome the ambipolar current, asymmetry must be introduced between the source and drain. In this paper, we investigate the performances of DG TFET with step channel thickness (SC TFET) by utilizing the 2D simulation. The asymmetry between source and drain is introduced throu… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
3
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
6
1
1

Relationship

0
8

Authors

Journals

citations
Cited by 23 publications
(5 citation statements)
references
References 35 publications
0
3
0
Order By: Relevance
“…It can be described as a gated p-i-𝑛+ diode, with the gate residing on an undoped or intrinsic region, which forms the channel. 𝑝+ region is named as the source and 𝑛+region is the drain [9,10]. A look at the structure gives the impression of its similarity to the conventional MOSFET structure, but there exists a fundamental difference in the switching mechanism.…”
Section: Tfet Basic Definition and Its Workingmentioning
confidence: 99%
“…It can be described as a gated p-i-𝑛+ diode, with the gate residing on an undoped or intrinsic region, which forms the channel. 𝑝+ region is named as the source and 𝑛+region is the drain [9,10]. A look at the structure gives the impression of its similarity to the conventional MOSFET structure, but there exists a fundamental difference in the switching mechanism.…”
Section: Tfet Basic Definition and Its Workingmentioning
confidence: 99%
“…However, the main problems of TFETs are low on-state current (I on ), high off-state current (I off ), and ambipolar behavior, which are the main challenges that traditional TFETs face [11][12][13]. The driven current of the conventional TFETs is determined by the gatemodulated tunneling diode.…”
Section: Introductionmentioning
confidence: 99%
“…Going forward, silicon germanium (SiGe) will most likely be adopted for future lowpower very-large-scale integration (VLSI) technologies among all material systems for TFET applications, owing to its VLSI compatibility, mature synthesis techniques, and tunable bandgap [11,33,34]. In this work, we propose a new Si 1-x Ge x /Si heterostructure TFET with high-k/low-k dual material heterogeneous gate dielectric and a heavily doped pocket within the channel (HJ-HD-P-DGTFET).…”
Section: Introductionmentioning
confidence: 99%
“…The DM-FET biosensors performance is limited by short channel effects (SCEs), which are encountered in the process of downscaling the device size, and the FET device's subthreshold swing restriction also becomes one of the main obstacles to achieving better sensitivity results [9][10]. Because of its capacity to overcome the constraint on the subthreshold swing (SS < 60 mV/Dec) and its novel band-to-band tunneling of charge carriers, the tunnel FET device has arisen as a possible alternative to the traditional FET-based device [11][12][13][14][15][16][17][18][19][20].…”
Section: I: Introductionmentioning
confidence: 99%