1997
DOI: 10.1002/1521-396x(199707)162:1<421::aid-pssa421>3.0.co;2-b
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Simulation of SiC High Power Devices

Abstract: The impact of SiC on high power devices and their applications is analysed using simulations in a very wide range of design voltages. First, a detailed presentation of the anisotropic form of the basic equations and of the physical models for 4H‐SiC used in the simulations is given. Following that the application ranges of unipolar and bipolar devices in the domains of voltage and frequency are predicted in the case of IGBTs versus MOSFETs and PiN versus Schottky rectifiers based on comparisons of the on‐state… Show more

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Cited by 125 publications
(56 citation statements)
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“…In particular, we assumed that and mobility and diffusion coefficients can be described by Einstein's equations. Finally the system of the basic equations for simulation model of Schottky diode must be given by expressions of the form [2], [5]:…”
Section: Resultsmentioning
confidence: 99%
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“…In particular, we assumed that and mobility and diffusion coefficients can be described by Einstein's equations. Finally the system of the basic equations for simulation model of Schottky diode must be given by expressions of the form [2], [5]:…”
Section: Resultsmentioning
confidence: 99%
“…In the presented model also were included Shockley-Read-Hall model recombination, Auger recombination and anisotropic impact ionization [5]. Boundary conditions between Ni metal contacts for 4H-SiC layer on a lateral surface of the cylinder were used as standard for Schottky diode [2], [5].…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The low-field mobility model used in the simulation is given by [30][31][32] l n;p ¼ l n;p;min T 300 a n;p þ l n;p;max…”
Section: Materials Parameters and Simulation Methodsmentioning
confidence: 99%
“…The electron and hole majority carrier mobility as functions of temperature, doping and directions in epitaxially grown 4H-SiC material has been experimentally given, and it is found from their measurements that the electron mobility of the \11 " 20[ direction for 4H-SiC is 0.83 times of that of the \0001[ direction above 200 K [30,32], as listed in Table 3. Meanwhile, the widely used parallel field mobility (FLDMOB) model is employed for 4H-SiC high-field mobility in this simulation, which can be described as…”
Section: Materials Parameters and Simulation Methodsmentioning
confidence: 99%