Simulation of Gas-Dynamic and Thermal Processes of Reduction of Molybdenum Fluoride and Synthesis of Its Carbide in Inductively Coupled Radiofrequency Plasma

Thermodynamic Analysis of Preparation of SiBCN Films Using a Trimethylaminoborane–Tetramethyldisilazane Gas Mixture

“…According to the available literature data, the following gas mixtures are used in synthesis of SiBCN coatings: SiMe 4 + H 2 + BF 3 + Ar + N 2 + He [9], SiCl 3 Me + NH 3 + BCl 3 + H 2 + Ar [10,11], (SiMe 3 ) 2 + Me 3 N•BH 3 + Ar [12], and volatile organosilicon and organoboron compounds mixed with nitrogen and argon [13][14][15]. To optimize the parameters of the deposition of coatings from complex gas mixturesthe deposition temperature, the total pressure in the system, and the composition of the initial gas mixture, it is useful to perform a preliminary thermodynamic analysis of the CVD process [16][17][18][19]. Thermodynamic modeling of the Si-B-C-N-Cl-H system has been carried out in [20], where the possibility of fabrication of SiBCN ceramics from a SiCl 3 Me + NH 3 + BCl 3 + H 2 + Ar mixture has been shown and it has been found that the predominant condensed phases are SiC, Si 3 N 4 , BN, B 4 C, and C.…”