Simulation of Effective Production of Very High Frequency Hydrogen Plasma Using a Balanced Power Feeding Method

Uchino³

et al. 2018

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Two-dimensional simulations of a triode VHF SiH 4 plasma (60 MHz) were performed using a fluid model, where the plasma was realized using multirod electrodes. Higher-order silanes that are responsible for the quality of amorphous silicon were included in the simulations. A typical VHF plasma with an electron density higher than 10 16 m %3 and an electron temperature lower than 3 eV was predicted between discharge electrodes while the electron density near the substrate was very low. The SiH 3 density was fairly uniform between discharge electrodes and did not decrease rapidly near the substrate, suggesting a high-speed deposition. Higher-order molecules and radicals that play an important role in dust formation had similar spatial profiles and their densities were five to 6 orders of magnitude lower than the SiH 3 density. We discussed the effect of the rate constant of reaction, SiH 3 + SiH 3 G SiH 2 + SiH 4 , on the SiH 3 density.

Section: Resultsmentioning

confidence: 99%

“…PHM is described in detail in Ref. 21. For a more strict simulation, the electron energy distribution function (EEDF) should be included.…”

Section: Description Of Simulation Modelmentioning

confidence: 99%

Section: Description Of Simulation Modelmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Two dimensional simulations of triode VHF SiH₄plasma

Uchino³

et al. 2018

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“…In our study, we have simulated a BPF hydrogen plasma in a cylindrical chamber where the calculation area outside the electrodes is very large compared with that inside the electrodes. 21,22) It was confirmed that the BPF method reduced the electron density outside the electrodes and increased that inside the electrodes. In addition, we found that the discharge outside the electrodes decreased with high pressure in the BPF model.…”

Section: Introductionmentioning

confidence: 87%

Simulation of balanced power feeding plasma surrounded by a metal box

Ogiwara

Uchino

et al. 2014

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The characteristics of a balanced power feeding VHF plasma was examined by two-dimensional simulation in which a pair of parallel disc discharge electrodes was surrounded by a metal box. The simulation results indicated that charged particles were generated between the discharge electrodes and diffused outside the electrodes. It was found that the discharge outside the electrodes was suppressed by shortening the distance between the electrode and the metal box, and that the discharge state between the electrodes was completely independent of that distance. The discharge with bare metal electrodes provided a lower electron density outside the electrodes than that with electrodes whose outer surfaces were covered by insulators.

Mechanism of VHF H₂ plasma production at high pressures

Chiu

et al. 2016

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A VHF H2 plasma was produced by a narrow-gap discharge at high pressures, and the plasma parameters were examined with the Langmuir probe. A bi-Maxwellian electron distribution was observed near the discharge electrode at a discharge gap of 10 mm, while a Maxwellian distribution was seen near the center. When the discharge gap was 15 mm, electrons had a Maxwellian distribution independent of the position. It was found that there must be a threshold in the discharge gap for stochastic heating to occur. The plasma potential near the discharge electrode was higher than that near the center of the interelectrode gap, suggesting the existence of negative ions. The simulation using the plasma hybrid code was carried out. The spatial profiles of the density and temperature of electrons were similar to the experimental results. The plasma potential had a hill-like profile that was quite different from the measured one. The negative ion density was negligible.