2023
DOI: 10.1109/ted.2022.3228827
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Simulation of AlGaN/GaN MISFET With 3.6-GW/cm2 High FOM by SIPOS Field Plates Electric Field Modulation

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“…So, the electric field distribution in the drift region of the SIPOS-IGBT is also modulated to be uniform, which enables a thinner drift region like a superjunction structure or HK structure. Moreover, an electron accumulation layer can be formed along the SIPOS pillar during the on state [ 27 , 28 , 29 ], and in the SIPOS-IGBT, the accumulation layer increases the injection efficiency of the anode of the “PiN region” in the device, so the total carrier concentration in the drift region is increased. With the effects mentioned above, the Von value is significantly reduced.…”
Section: Device Structure and Mechanismmentioning
confidence: 99%
“…So, the electric field distribution in the drift region of the SIPOS-IGBT is also modulated to be uniform, which enables a thinner drift region like a superjunction structure or HK structure. Moreover, an electron accumulation layer can be formed along the SIPOS pillar during the on state [ 27 , 28 , 29 ], and in the SIPOS-IGBT, the accumulation layer increases the injection efficiency of the anode of the “PiN region” in the device, so the total carrier concentration in the drift region is increased. With the effects mentioned above, the Von value is significantly reduced.…”
Section: Device Structure and Mechanismmentioning
confidence: 99%