2012
DOI: 10.1016/j.ijleo.2011.07.007
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Simulation of 3D inclined/rotated UV lithography and its application to microneedles

Abstract: a b s t r a c tA 3D model is set up to simulate the exposure process of inclined/rotated UV lithography for negative SU-8 resists. The formation of inclined resist pillars and microstructures with truncated cone shapes is simulated based on a 3D exposure model in combination with a post exposure bake model for chemically amplified resists and the Mack development model. As one of the interesting applications employing this promising lithography technique for MEMS fabrication, a solid microneedle for drug deliv… Show more

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Cited by 7 publications
(1 citation statement)
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“…Previously, 3D structures of negative photoresist have been developed by utilizing diffraction effects [22][23][24][25] . Several studies have also described a physical model of exposure based on the Fresnel diffraction theory for inclined UV lithography [26][27][28] .…”
Section: Uv Light Diffractionmentioning
confidence: 99%
“…Previously, 3D structures of negative photoresist have been developed by utilizing diffraction effects [22][23][24][25] . Several studies have also described a physical model of exposure based on the Fresnel diffraction theory for inclined UV lithography [26][27][28] .…”
Section: Uv Light Diffractionmentioning
confidence: 99%