Simulation and optimization of microlens hot-melting fabricating process based on finite element method

Jin, Jian; Di, Si; Lin, Wenyu; Wang, Xudi

doi:10.1016/j.mee.2021.111634

Cited by 3 publications

(1 citation statement)

References 18 publications

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“…In recent years, the microlens array (MLA) has attracted lots of attention for its widespread application of optical communicators and integration of opto-electronic device, such as imaging sensors, lighting, display, and solar cells. 1,2 There are many techniques for the production of MLAs, 3,4 such as micro-injection, [5][6][7] laser direct writing, 8,9 screen printing, 10 photolithography, 11,12 photo-polymerization, 13 hot melting, 14 ion exchange, 15 and chemical vapor deposition. 16 Among these, photoresist thermal reflow (or hot melting) method is an effective technique for fabricating MLAs.…”

Section: Introductionmentioning

confidence: 99%

Study on the surface topography changes of photoresist in the design and fabrication of microlens array

Dan,

Liying,

Min

et al. 2024

Opt. Eng.

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The fabrication method of microlens arrays with diameters from 20 to 90 μm based on thermal reflow and dry etch structure transition process is demonstrated. The key process parameters of microlens design and production are obtained by theoretical calculation. And the research of photoresist (AZ4330) surface topography changes during thermal reflow process is studied in detail, which is helpful for microlens array design and process optimization. The photoresist microlens arrays are transferred into quartz by dry etching process. The measurement data indicate that the photoresist microlens arrays have good surface topography and high surface quality, and the optical property of quartz microlens is in good agreement with the theoretical design. This method can be widely used to prepare high quality microlens arrays in optical applications.

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Section: Introductionmentioning

confidence: 99%

Study on the surface topography changes of photoresist in the design and fabrication of microlens array

Dan,

Liying,

Min

et al. 2024

Opt. Eng.

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Hybrid microlens array/grating fabrication based on microfluidic system and its application in the enhancement of spectral resolution

Jin

Dang

Wang³

et al. 2022

Optics & Laser Technology

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Maskless lithography for large area patterning of three-dimensional microstructures with application on a light guiding plate

Syu¹,

Huang²,

Jiang³

et al. 2023

Opt. Express

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This paper presents a maskless lithography system that can perform three-dimensional (3D) ultraviolet (UV) patterning on a photoresist (PR) layer. After PR developing processes, patterned 3D PR microstructures over a large area are obtained. This maskless lithography system utilizes an UV light source, a digital micromirror device (DMD), and an image projection lens to project a digital UV image on the PR layer. The projected UV image is then mechanically scanned over the PR layer. An UV patterning scheme based on the idea of obliquely scanning and step strobe lighting (OS3L) is developed to precisely control the spatial distribution of projected UV dose, such that desired 3D PR microstructures can be obtained after PR development. Two types of concave microstructures with truncated conical and nuzzle-shaped cross-sectional profiles are experimentally obtained over a patterning area of 160 ×115 mm2. These patterned microstructures are then used for replicating nickel molds and for mass-production of light-guiding plates used in back-lighting and display industry. Potential improvements and advancements of the proposed 3D maskless lithography technique for future applications will be addressed.

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Simulation and optimization of microlens hot-melting fabricating process based on finite element method

Cited by 3 publications

References 18 publications

Study on the surface topography changes of photoresist in the design and fabrication of microlens array

Study on the surface topography changes of photoresist in the design and fabrication of microlens array

Hybrid microlens array/grating fabrication based on microfluidic system and its application in the enhancement of spectral resolution

Maskless lithography for large area patterning of three-dimensional microstructures with application on a light guiding plate

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