Simulation analysis of influence factors for preparation of dispersed cap-open carbon nanotubes using CCVD

Abstract

In order to investigate the reaction mechanism and production rate for the growth of dispersed cap-open carbon nanotubes (CNTs) in catalyst chemical vapor deposition, computational fluid dynamics (CFD) model with multi-step reaction was developed in this study. The CFD calculations coupled with temperature field and concentration field demonstrated that laminar flow conditions were presented and steep thermal gradient and concentration gradient existed in the axis of the reactor. Applying the CFD calculation, total deposition rate of CNTs in the reactor were predicted with the variation of the processing parameters. The results show that the maximum deposition rate can be obtained with the temperature from 1050 to 1200 K and the flow rate of the ethanol should be controlled over 300 sccm.

High Peel Strength and Flexible Aligned Carbon Nanotubes/Etched Al Foil Composites with Boosted Supercapacitor and Thermal Dissipation Performances

“…However, the higher I G / I D ratio of CNTs grown on etched Al foil proved their higher graphitization degree than the CNTs grown on smooth Al foil. As known, the important parameters influencing the growth process of CNTs by CVD include quality of catalyst, ratio of source to reducing gas, flow rate of carrier gas, deposition temperature, and growth time. , Rashid et al proposed that gas flow behavior inside the horizontal CVD reactor was asymmetrical in nature and dominated by recirculation effects. The gas circulation observed after the carrier gas and carbon source were injected into the quartz tube led to the uneven distribution of the mixed reacting materials such as catalyst, carbon source, and reducing and carrying gases in different locations of the quartz tube.…”