Abstract:Silicon nitride (SiNx, x ∼ 1) thin films were deposited by chemical vapor deposition on silicon oxide (SiO2) substrates by combining controlled pulses of the precursor 1,3,5-tri(isopropyl)cyclotrisilazane (TICZ, C9H27N3Si3) with a continuous ammonia (NH3) plasma. This plasma-assisted pulsed CVD (PPCVD) process enables the integration of the nanoscale thickness and uniformity control achieved in atomic layer deposition with the efficiency of plasma-enhanced CVD (PE-CVD). TICZ was selected because it is a nonpyr… Show more
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