2016
DOI: 10.1021/acs.langmuir.6b01084
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Simple, Reversible, and Fast Modulation in Superwettability, Gradient, and Adsorption by Counterion Exchange on Self-Assembled Monolayer

Abstract: A simple fabrication method for preparation of surfaces able to switch from superhydrophobic to superhydrophilic state in a reversible and fast way is described. A self-assembled monolayer (SAM) consisting of quaternary ammonium group with aliphatic tail bearing terminal thiol functionality was created on gold nano/microstructured and gold planar surfaces, respectively. A rough nano/microstructured surface was prepared by galvanic reaction on a silicon wafer. The reversible counterion exchange on the rough sur… Show more

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Cited by 37 publications
(37 citation statements)
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References 62 publications
(108 reference statements)
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“…In 2004, Choi et al prepared self-assembled monolayers (SAM) with imidazolium groups on smooth Au and Si/SiO 2 substrates [1][2][3]. They studied the effect of a series of anions as shown in Figure 1 and they found that the surface hydrophobicity increases like this: Br The substituent has also an important influence on the surface wettability [3,4]. For example, using a long substituent with 1-octyl-3-methylimidazolium ([omim]), θ w was 68, 72, and 75° for Br ) θ w did not change.…”
Section: Ion Exchangementioning
confidence: 99%
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“…In 2004, Choi et al prepared self-assembled monolayers (SAM) with imidazolium groups on smooth Au and Si/SiO 2 substrates [1][2][3]. They studied the effect of a series of anions as shown in Figure 1 and they found that the surface hydrophobicity increases like this: Br The substituent has also an important influence on the surface wettability [3,4]. For example, using a long substituent with 1-octyl-3-methylimidazolium ([omim]), θ w was 68, 72, and 75° for Br ) θ w did not change.…”
Section: Ion Exchangementioning
confidence: 99%
“…In order to elaborate reversible superhydrophobic properties by ion exchange, gold micro and nanostructured substrates were performed by electroless etching process by immersing silicon substrates in aqueous solution of HAuCl 4 and HF (Figure 2). The surface was then modified by SAM using a thiol terminated by a quaternary ammonium.…”
Section: Ion Exchangementioning
confidence: 99%
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